{"title":"熔盐中钼的电化学渗硼","authors":"A. Bonomi, H. Giess, C. Gentaz","doi":"10.1016/0300-9416(73)90025-4","DOIUrl":null,"url":null,"abstract":"<div><p>This work describes a study of the growth of a Mo<sub>2</sub>B<sub>5</sub> layer, obtained by diffusion of boron produced by cathodic reduction of KBF<sub>4</sub> on molybdenum metal in molten fluorides, at 830°C.</p><p>The growth of the Mo<sub>2</sub>B<sub>5</sub> layer has been studied by the galvanostatic method, and is controlled by diffusion of boron in the boride layer.</p><p>The experimental results show that boriding may occur with about 100% Faraday efficiency, and the calculated diffusion coefficient of boron in the surface layer is in agreement with the literature data obtained by chemical vapour boriding studies.</p></div>","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"1 5","pages":"Pages 419-427"},"PeriodicalIF":0.0000,"publicationDate":"1973-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(73)90025-4","citationCount":"15","resultStr":"{\"title\":\"Electrochemical boriding of molybdenum in molten salts\",\"authors\":\"A. Bonomi, H. Giess, C. Gentaz\",\"doi\":\"10.1016/0300-9416(73)90025-4\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>This work describes a study of the growth of a Mo<sub>2</sub>B<sub>5</sub> layer, obtained by diffusion of boron produced by cathodic reduction of KBF<sub>4</sub> on molybdenum metal in molten fluorides, at 830°C.</p><p>The growth of the Mo<sub>2</sub>B<sub>5</sub> layer has been studied by the galvanostatic method, and is controlled by diffusion of boron in the boride layer.</p><p>The experimental results show that boriding may occur with about 100% Faraday efficiency, and the calculated diffusion coefficient of boron in the surface layer is in agreement with the literature data obtained by chemical vapour boriding studies.</p></div>\",\"PeriodicalId\":100399,\"journal\":{\"name\":\"Electrodeposition and Surface Treatment\",\"volume\":\"1 5\",\"pages\":\"Pages 419-427\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1973-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/0300-9416(73)90025-4\",\"citationCount\":\"15\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Electrodeposition and Surface Treatment\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/0300941673900254\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electrodeposition and Surface Treatment","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0300941673900254","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Electrochemical boriding of molybdenum in molten salts
This work describes a study of the growth of a Mo2B5 layer, obtained by diffusion of boron produced by cathodic reduction of KBF4 on molybdenum metal in molten fluorides, at 830°C.
The growth of the Mo2B5 layer has been studied by the galvanostatic method, and is controlled by diffusion of boron in the boride layer.
The experimental results show that boriding may occur with about 100% Faraday efficiency, and the calculated diffusion coefficient of boron in the surface layer is in agreement with the literature data obtained by chemical vapour boriding studies.
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