低AVT晶体管的SRAM单元优化

L. Clark, S. Leshner, G. Tien
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引用次数: 6

摘要

在本文中,我们描述了一种六晶体管静态随机存取存储器(SRAM)单元优化方法,该方法可以显著改善晶体管的匹配,同时保持与基线设计的兼容性。我们简要地描述了减小的AVT晶体管,并表明它们允许大幅提高最小SRAM工作电压(Vmin)和改进的阵列泄漏。采用一种有效的实验因子设计(DOE)作为伪蒙特卡罗发生器,直接模拟了分布尾部的点。高效的方法被证明可以进行优化和“假设”场景调查。给出了在65纳米制程上的模拟结果和在28纳米制程上的模拟结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
SRAM cell optimization for low AVT transistors
In this paper, we describe a six-transistor static random access memory (SRAM) cell optimization methodology for transistors with significantly improved matching, while maintaining compatibility with the baseline design. We briefly describe the reduced AVT transistors and show that they allow substantially improved minimum SRAM operating voltage (Vmin) and improved array leakage. Using an efficient design of experiments (DOE) factorial as a pseudo-Monte Carlo generator, points on the tail of the distribution are directly simulated. The highly efficient method is shown to allow optimization and `what if' scenario investigations. Simulation and silicon results on a 65-nm process as well as simulation results on a 28-nm process are shown.
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