用HIPIMS XRR测量Fe/Nb多层和Fe/Nb/Fe三层沉积界面扩散研究

ADVANCES IN BASIC SCIENCE (ICABS 2019) Pub Date : 2019-08-29 DOI:10.1063/1.5122434

D. Kumar, M. Gupta, D. Kumar, A. Singh

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引用次数: 1

摘要

采用高功率脉冲磁控溅射技术，分别制备了Nb厚度dNb为35 A、Fe厚度dFe为35 A的溅射Fe/Nb多层膜和Nb厚度dNb为50 A、Fe厚度dFe为120 A的溅射Fe/Nb/Fe三层膜。x射线反射率(XRR)测量图显示薄膜结构质量高，表面和界面粗糙度低。用XRR比较了常规直流磁控溅射(CMS)和高功率脉冲磁控溅射(HIPIMS)在相同平均功率下制备的铌厚度dNb在150 ~ 700a范围内的铌薄膜。利用Parratt32软件拟合得到的XRR模式。结果表明，与CMS法相比，HIPIMS法生长的薄膜具有更高的密度和界面粗糙度。沉积速率随沉积功率的增大而增大;它与沉积功率呈线性关系。采用高功率脉冲磁控溅射技术，分别制备了Nb厚度dNb为35 A、Fe厚度dFe为35 A的溅射Fe/Nb多层膜和Nb厚度dNb为50 A、Fe厚度dFe为120 A的溅射Fe/Nb/Fe三层膜。x射线反射率(XRR)测量图显示薄膜结构质量高，表面和界面粗糙度低。用XRR比较了常规直流磁控溅射(CMS)和高功率脉冲磁控溅射(HIPIMS)在相同平均功率下制备的铌厚度dNb在150 ~ 700a范围内的铌薄膜。利用Parratt32软件拟合得到的XRR模式。结果表明，与CMS法相比，HIPIMS法生长的薄膜具有更高的密度和界面粗糙度。随着沉积功率的增大，沉积速率逐渐增大。

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Deposition of Fe/Nb multilayers and Fe/Nb/Fe trilayers using HIPIMS: XRR measurements for interface diffusion study

Sputtered Fe/Nb multilayers were prepared with Nb thicknesses dNb of 35 A and with Fe thicknesses dFe of 35 A and sputtered Fe/Nb/Fe trilayers was deposited with Nb thicknesses dNb in the range 50 A and with Fe thicknesses dFe in the range 120 A, respectively using high power impulse magnetron sputtering technique. X-ray reflectivity (XRR) measured patterns revealed the high quality of the film structure with a low surface and interface roughness. Nb thin films synthesized with Nb thicknesses dNb in the range 150-700 A using conventional direct-current magnetron sputtering (CMS) have been compared with those made by high power impulse magnetron sputtering (HIPIMS) operated at the same average power by means of XRR. The obtained XRR patterns were fitted using the Parratt32 software. It was observed that films grown by HIPIMS method have a higher density and interface roughness than that grown by the CMS method. It was also observed that the deposition rate is increasing with the increase of deposition power; it shows linear behavior with deposition power.Sputtered Fe/Nb multilayers were prepared with Nb thicknesses dNb of 35 A and with Fe thicknesses dFe of 35 A and sputtered Fe/Nb/Fe trilayers was deposited with Nb thicknesses dNb in the range 50 A and with Fe thicknesses dFe in the range 120 A, respectively using high power impulse magnetron sputtering technique. X-ray reflectivity (XRR) measured patterns revealed the high quality of the film structure with a low surface and interface roughness. Nb thin films synthesized with Nb thicknesses dNb in the range 150-700 A using conventional direct-current magnetron sputtering (CMS) have been compared with those made by high power impulse magnetron sputtering (HIPIMS) operated at the same average power by means of XRR. The obtained XRR patterns were fitted using the Parratt32 software. It was observed that films grown by HIPIMS method have a higher density and interface roughness than that grown by the CMS method. It was also observed that the deposition rate is increasing with the increase of deposition powe...

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ADVANCES IN BASIC SCIENCE (ICABS 2019)

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