{"title":"部分电离束沉积纯铝膜的电迁移活化能","authors":"O.V. Kononenko, E.D. Ivanov, V.N. Matveev, I.I. Khodos","doi":"10.1016/0956-716X(95)00450-A","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":101150,"journal":{"name":"Scripta Metallurgica et Materialia","volume":"33 12","pages":"Pages 1981-1986"},"PeriodicalIF":0.0000,"publicationDate":"1995-12-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0956-716X(95)00450-A","citationCount":"12","resultStr":"{\"title\":\"Electromigration activation energy in pure aluminum films deposited by partially ionized beam technique\",\"authors\":\"O.V. Kononenko, E.D. Ivanov, V.N. Matveev, I.I. Khodos\",\"doi\":\"10.1016/0956-716X(95)00450-A\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":101150,\"journal\":{\"name\":\"Scripta Metallurgica et Materialia\",\"volume\":\"33 12\",\"pages\":\"Pages 1981-1986\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-12-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/0956-716X(95)00450-A\",\"citationCount\":\"12\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Scripta Metallurgica et Materialia\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/0956716X9500450A\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Scripta Metallurgica et Materialia","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0956716X9500450A","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}