极紫外干涉光刻与桌面系统

2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science Pub Date : 2008-05-04 DOI:10.1109/CLEO.2008.4551312

P. Wachulak, M. Marconi, W. Rockward, D. Hill, E. Anderson, C. Menoni, J. Rocca

{"title":"极紫外干涉光刻与桌面系统","authors":"P. Wachulak, M. Marconi, W. Rockward, D. Hill, E. Anderson, C. Menoni, J. Rocca","doi":"10.1109/CLEO.2008.4551312","DOIUrl":null,"url":null,"abstract":"We demonstrate an amplitude division interferometer that using illumination from a high brightness desk top extreme ultraviolet (EUV) laser creates large area arrays of lines, holes and dots with sub-100 nm feature size.","PeriodicalId":6382,"journal":{"name":"2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science","volume":"8 1","pages":"1-2"},"PeriodicalIF":0.0000,"publicationDate":"2008-05-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Extreme ultraviolet interferometric lithography with a desk-top system\",\"authors\":\"P. Wachulak, M. Marconi, W. Rockward, D. Hill, E. Anderson, C. Menoni, J. Rocca\",\"doi\":\"10.1109/CLEO.2008.4551312\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We demonstrate an amplitude division interferometer that using illumination from a high brightness desk top extreme ultraviolet (EUV) laser creates large area arrays of lines, holes and dots with sub-100 nm feature size.\",\"PeriodicalId\":6382,\"journal\":{\"name\":\"2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science\",\"volume\":\"8 1\",\"pages\":\"1-2\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-05-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CLEO.2008.4551312\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEO.2008.4551312","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

我们演示了一种振幅分割干涉仪，该干涉仪使用高亮度桌面极紫外(EUV)激光器的照明，可以产生低于100 nm特征尺寸的大面积线、孔和点阵列。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Extreme ultraviolet interferometric lithography with a desk-top system

We demonstrate an amplitude division interferometer that using illumination from a high brightness desk top extreme ultraviolet (EUV) laser creates large area arrays of lines, holes and dots with sub-100 nm feature size.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science

自引率

0.00%

发文量