高tc薄膜的多层加工及叠层双晶约瑟夫森结

H.Q. Li, R.H. Ono , D.A. Rudman , L.R. Vale , S.H. Liou
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引用次数: 1

摘要

详细报道了一种制备高温超导多层电路的新工艺。使用接近曝光形成可控制的浅边缘,这是交叉和互连所必需的。通过接触曝光和接近曝光相结合,可以获得边缘较浅的小特征。利用该工艺制备了STO双晶衬底上的堆叠约瑟夫森结并进行了测试。采用该工艺制备的多层低电感dc-SQUID具有较大的电压调制效果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Multilayer processing of high-Tc films and stacked bicrystal Josephson junctions

A new process for making high-temperature superconducting multilayer circuits is reported in detail. Proximity exposure was used to form controllable shallow edges which are required for the crossovers and interconnects. Small features with shallow edges can be achieved by the combination of contact exposure and proximity exposure. Stacked Josephson junctions on STO bicrystal substrates were prepared using this process and tested. A multilayer low-inductance dc-SQUID fabricated using this process shows large voltage modulation.

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