V. Nguyen Van, S. Fisson, K. Yu-Zhang, M. Harmelin
{"title":"共蒸发薄膜和熔纺带状Al1−xMnx合金中的电子输运","authors":"V. Nguyen Van, S. Fisson, K. Yu-Zhang, M. Harmelin","doi":"10.1016/0025-5416(88)90326-6","DOIUrl":null,"url":null,"abstract":"<div><p>Accurate measurements of the d.c. electrical resistivity (between 30 and 300 K) and of the thermoelectric power (between 80 and 300 K) were performed on two types of well-characterized <em>Al</em><sub>1−<em>x</em></sub><em>Mn</em><sub><em>x</em></sub> alloy samples: amorphous thin films (with 10 at.% ⩽ <em>x</em> ⩽ 14 at.%) deposited by co-evaporation on cold substrates, and Al<sub>89</sub>Mn<sub>11</sub> melt-spun ribbon in quasi-crystalline (asprepared) and crystalline (annealed) states. The results are compared and emphasize the sensitivity of the transport properties to structural changes.</p></div>","PeriodicalId":100890,"journal":{"name":"Materials Science and Engineering","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1988-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0025-5416(88)90326-6","citationCount":"1","resultStr":"{\"title\":\"Electron transport in co-evaporated thin film and melt-spun ribbon Al1−xMnx alloys\",\"authors\":\"V. Nguyen Van, S. Fisson, K. Yu-Zhang, M. Harmelin\",\"doi\":\"10.1016/0025-5416(88)90326-6\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Accurate measurements of the d.c. electrical resistivity (between 30 and 300 K) and of the thermoelectric power (between 80 and 300 K) were performed on two types of well-characterized <em>Al</em><sub>1−<em>x</em></sub><em>Mn</em><sub><em>x</em></sub> alloy samples: amorphous thin films (with 10 at.% ⩽ <em>x</em> ⩽ 14 at.%) deposited by co-evaporation on cold substrates, and Al<sub>89</sub>Mn<sub>11</sub> melt-spun ribbon in quasi-crystalline (asprepared) and crystalline (annealed) states. The results are compared and emphasize the sensitivity of the transport properties to structural changes.</p></div>\",\"PeriodicalId\":100890,\"journal\":{\"name\":\"Materials Science and Engineering\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1988-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/0025-5416(88)90326-6\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Science and Engineering\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/0025541688903266\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science and Engineering","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0025541688903266","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Electron transport in co-evaporated thin film and melt-spun ribbon Al1−xMnx alloys
Accurate measurements of the d.c. electrical resistivity (between 30 and 300 K) and of the thermoelectric power (between 80 and 300 K) were performed on two types of well-characterized Al1−xMnx alloy samples: amorphous thin films (with 10 at.% ⩽ x ⩽ 14 at.%) deposited by co-evaporation on cold substrates, and Al89Mn11 melt-spun ribbon in quasi-crystalline (asprepared) and crystalline (annealed) states. The results are compared and emphasize the sensitivity of the transport properties to structural changes.