密度对(AlN)0.9(Si3N4)0.1陶瓷显微组织和力学行为的影响

Thao Nguyen Thi, Vinh Le Van
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引用次数: 0

摘要

采用分子动力学(MD)模拟方法研究了密度在2.95 ~ 3.88 g.cm-3之间的三种(AlN)0.9(Si3N4)0.1陶瓷材料样品。详细研究了密度对结构单元、键长、最近邻和孔洞等微观结构的影响。分析表明,这些样品由AlN和Si3N4材料组成。AlN材料区域主要由AlN晶体和少量的AlN非晶态组成。Si3N4材料的区域具有非晶结构。空穴分析表明,存在Si原子向AlN非晶区扩散,反之存在Al原子向Si3N4非晶区扩散。大半径的空洞集中在非晶结构区。这些空洞的数量随着密度的增加而迅速减少。这种还原显著改善了样品的力学性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Density effects on microstructures and mechanical behavior of (AlN)0.9(Si3N4)0.1 ceramic
Molecular dynamics (MD) simulations have been used to study three samples of (AlN)0.9(Si3N4)0.1 ceramic materials with density varying from 2.95 to 3.88 g.cm-3. The influence of density on microstructure, such as the change of structural units, bond lengths, the nearest common neighbors, and voids, was studied in detail. The analysis shows that these samples consist of regions of AlN and Si3N4 materials. The region of AlN material consists mostly of AlN crystals and small amount of AlN amorphous. The region of Si3N4 material has amorphous structure. Void analysis shows that there is the diffusion of Si atoms into the AlN amorphous region and conversely there is the diffusion of Al atoms into the Si3N4 amorphous region. The voids with large radius are localized in the amorphous structure region. The number of these voids decreases rapidly with the increase of density. This reduction improves significantly mechanical properties of samples.
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