高表面增强拉曼散射性能的晶圆级2H - MoS2单层:电荷转移与分子共振耦合

K. An, Mingpeng Chen, Bingchen He, Haoqiang Ai, Wei Wang, Zhihong Zhang, Z. Pan, Shi Chen, W. Ip, K. Lo, J. Chai, Shijie Wang, Ming Yang, Shuangpeng Wang, Hui Pan
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引用次数: 6

摘要

表面增强拉曼散射(SERS)作为一种新型的、高效的分子探测分析技术受到了广泛的关注。半导体衬底由于易于与电子器件集成而被广泛研究用于SERS。在这项工作中,使用未经额外处理的晶圆级半导体MoS2单层(2H‐MoS2‐ML)作为SERS衬底,这表明自然形成的MoS2 ML具有优异的化学稳定性,高均匀性和高灵敏度。在532 nm激发激光下,罗丹明6G (R6G)的检测浓度极限可达1 × 10−8 m,增强因子约为4.5 × 106,是迄今为止在2H‐MoS2‐ML上观察到的最高SERS性能。实验和计算研究表明,光增强电荷转移与分子共振耦合有助于显著的SERS。除R6G外,2H‐MoS2‐ML对紫红和结晶紫也表现出良好的SERS信号。这些发现不仅对半导体过渡金属二硫族化合物(TMDs) MLs增强SERS性能的机理提供了深刻的理解,而且对新型SERS衬底的设计也有帮助。期望晶圆级tmd可以在SERS中找到实际应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Wafer‐Scale 2H‐MoS2 Monolayer for High Surface‐enhanced Raman Scattering Performance: Charge‐Transfer Coupled with Molecule Resonance
The surface‐enhanced Raman scattering (SERS) as a novel and efficient analytic technique to probe molecules has attracted tremendous attention. Semiconducting substrates have been widely investigated for their applications into SERS because of their easy integration with electronic devices. In this work, a wafer‐scale semiconducting MoS2 monolayer (2H‐MoS2‐ML) without additional treatment is used as the SERS substrate, which shows the naturally formed MoS2 ML has excellent chemical stability, high uniformity, and high sensitivity. It is found that the detection concentration limit can reach 1 × 10−8 m and the enhancement factor is about 4.5 × 106 for the rhodamine 6G (R6G) under a 532 nm excitation laser, which is the highest SERS performance observed on 2H‐MoS2‐ML up to now. The experimental and computational studies reveal that the photo‐enhanced charge transfer coupled with molecule resonance contribute to remarkable SERS. In addition to R6G, 2H‐MoS2‐ML shows good SERS signals on the detection of amaranth and crystal violet too. The findings not only provide an insightful understanding of the mechanism for the improved SERS performance of semiconducting transition‐metal dichalcogenides (TMDs) MLs, but are helpful for the design of novel SERS substrates. It is expected that the wafer‐scale TMDs may find practical applications in SERS.
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