二次电子发射产率测量静电系统的应用特点

IF 0.5 Q4 PHYSICS, NUCLEAR
S. Karpus, I. Shliahov, M. Liashchov, V. Borisenko, S. Kochetov, E. Tsiats’ko, O. Shopen
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引用次数: 0

摘要

对电子束与物质相互作用过程中二次电子发射的实验系统进行了分析。考虑了实验系统的三种最常见和方法上发展的变体。根据它们的设计特点和方法能力,它们允许根据初级电子束能量和样品厚度研究二次发射的主要参数。本文还讨论了实验测量系统的演变及其从简单的三电极系统到具有直通集电极的改进。还考虑了从所研究的目标表面发射的二次电子电流随目标器件结构特征的配准特性。讨论了所研制的三电极测量系统在研究薄膜发射特性方面的应用效果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
APPLICATION FEATURES OF THE ELECTROSTATIC SYSTEMS FOR MEASURING THE SECONDARY ELECTRON EMISSION YIELD
The analysis of the experimental systems for research of secondary electron emission during the interaction of electron beams with matter is presented. The three most common and methodologically developed variants of experimental systems are considered. According to their design features and methodological capabilities, they allow for the study of the main parameters of secondary emission depending on the primary electron beam energy and the sample thickness. The evolution of the experimental measuring systems and their improvement from simple to three-electrode systems with pass-through collectors is considered too. The peculiarities of registration of the secondary electrons current emitted from the studied target surface depending on the structural features of the target device are considered too. Application results of the developed three-electrode measuring system for research thin foil emission characteristics have been discussed.
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来源期刊
CiteScore
0.70
自引率
50.00%
发文量
0
审稿时长
2-4 weeks
期刊介绍: The journal covers the following topics: Physics of Radiation Effects and Radiation Materials Science; Nuclear Physics Investigations; Plasma Physics; Vacuum, Pure Materials and Superconductors; Plasma Electronics and New Methods of Acceleration.
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