P. Matusche , O. Nuyken , B. Voit , M. Van Damme , J. Vermeersch , W. De Winter , L. Alaerts
{"title":"基于偶氮化合物的水溶性光树脂","authors":"P. Matusche , O. Nuyken , B. Voit , M. Van Damme , J. Vermeersch , W. De Winter , L. Alaerts","doi":"10.1016/0923-1137(94)00093-K","DOIUrl":null,"url":null,"abstract":"<div><p>Polymeric azosulfonates lose their water solubility when exposed to UV light due to decomposition of the azo function. This effect can be used in water-based photoprinting processes. Water-soluble copolymers of azosulfonate containing repeat units and methyl methacrylate have been alternatively synthesized by a polymer-analogous reaction [1,2] and by direct copolymerization [3]. Both polymer types have been evaluated for application as photoresins in offset printing processes. The polymer made by copolymerization is superior and shows excellent results for photosensitivity, resolution, film-forming properties, and development in water, as well as for thermal and moisture storage stability.</p></div>","PeriodicalId":20864,"journal":{"name":"Reactive Polymers","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1995-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0923-1137(94)00093-K","citationCount":"8","resultStr":"{\"title\":\"Water-soluble photoresins based on polymeric azo compounds\",\"authors\":\"P. Matusche , O. Nuyken , B. Voit , M. Van Damme , J. Vermeersch , W. De Winter , L. Alaerts\",\"doi\":\"10.1016/0923-1137(94)00093-K\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Polymeric azosulfonates lose their water solubility when exposed to UV light due to decomposition of the azo function. This effect can be used in water-based photoprinting processes. Water-soluble copolymers of azosulfonate containing repeat units and methyl methacrylate have been alternatively synthesized by a polymer-analogous reaction [1,2] and by direct copolymerization [3]. Both polymer types have been evaluated for application as photoresins in offset printing processes. The polymer made by copolymerization is superior and shows excellent results for photosensitivity, resolution, film-forming properties, and development in water, as well as for thermal and moisture storage stability.</p></div>\",\"PeriodicalId\":20864,\"journal\":{\"name\":\"Reactive Polymers\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-02-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/0923-1137(94)00093-K\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Reactive Polymers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/092311379400093K\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Reactive Polymers","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/092311379400093K","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Water-soluble photoresins based on polymeric azo compounds
Polymeric azosulfonates lose their water solubility when exposed to UV light due to decomposition of the azo function. This effect can be used in water-based photoprinting processes. Water-soluble copolymers of azosulfonate containing repeat units and methyl methacrylate have been alternatively synthesized by a polymer-analogous reaction [1,2] and by direct copolymerization [3]. Both polymer types have been evaluated for application as photoresins in offset printing processes. The polymer made by copolymerization is superior and shows excellent results for photosensitivity, resolution, film-forming properties, and development in water, as well as for thermal and moisture storage stability.
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