定制电子/空穴阻挡层对单结太阳能电池光电性能的影响

Ming-Han Hsieh, Yuh‐Renn Wu, J. Singh
{"title":"定制电子/空穴阻挡层对单结太阳能电池光电性能的影响","authors":"Ming-Han Hsieh, Yuh‐Renn Wu, J. Singh","doi":"10.1109/PVSC.2012.6318110","DOIUrl":null,"url":null,"abstract":"This paper discusses the effect of electron/hole blocking layer on the photovoltaic performance of the single junction solar cells. The study shows that with a pure electron blocking on the p-type doping Si and a pure hole blocking layer on n-type doing, it is possible to enhance the open circuit voltage and short circuit current. Therefore, the Ga2O3 and TiO2 materials are chosen as the electron and hole blocking layer. The result shows that the open circuit voltage increases from 0.65 eV to 0.80 eV, and the short circuit current increases from 35.1 mA/cm2 to 35.9 mA/cm2, where the power efficiency can increase from 21.9 % to 27.6 %. The super lattice quantum well structure as a electron/hole blocking layer has also been examined in this paper.","PeriodicalId":6318,"journal":{"name":"2012 38th IEEE Photovoltaic Specialists Conference","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2012-06-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The effect of tailoring electron/hole blocking layers on the photovoltaic performance of the single junction solar cells\",\"authors\":\"Ming-Han Hsieh, Yuh‐Renn Wu, J. Singh\",\"doi\":\"10.1109/PVSC.2012.6318110\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper discusses the effect of electron/hole blocking layer on the photovoltaic performance of the single junction solar cells. The study shows that with a pure electron blocking on the p-type doping Si and a pure hole blocking layer on n-type doing, it is possible to enhance the open circuit voltage and short circuit current. Therefore, the Ga2O3 and TiO2 materials are chosen as the electron and hole blocking layer. The result shows that the open circuit voltage increases from 0.65 eV to 0.80 eV, and the short circuit current increases from 35.1 mA/cm2 to 35.9 mA/cm2, where the power efficiency can increase from 21.9 % to 27.6 %. The super lattice quantum well structure as a electron/hole blocking layer has also been examined in this paper.\",\"PeriodicalId\":6318,\"journal\":{\"name\":\"2012 38th IEEE Photovoltaic Specialists Conference\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-06-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 38th IEEE Photovoltaic Specialists Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PVSC.2012.6318110\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 38th IEEE Photovoltaic Specialists Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PVSC.2012.6318110","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

本文讨论了电子/空穴阻挡层对单结太阳能电池光电性能的影响。研究表明,在p型掺杂Si上采用纯电子阻隔层,在n型掺杂Si上采用纯空穴阻隔层,可以提高开路电压和短路电流。因此,选择Ga2O3和TiO2材料作为电子和空穴阻挡层。结果表明,开路电压由0.65 eV提高到0.80 eV,短路电流由35.1 mA/cm2提高到35.9 mA/cm2,功率效率由21.9%提高到27.6%。本文还研究了作为电子/空穴阻挡层的超晶格量子阱结构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effect of tailoring electron/hole blocking layers on the photovoltaic performance of the single junction solar cells
This paper discusses the effect of electron/hole blocking layer on the photovoltaic performance of the single junction solar cells. The study shows that with a pure electron blocking on the p-type doping Si and a pure hole blocking layer on n-type doing, it is possible to enhance the open circuit voltage and short circuit current. Therefore, the Ga2O3 and TiO2 materials are chosen as the electron and hole blocking layer. The result shows that the open circuit voltage increases from 0.65 eV to 0.80 eV, and the short circuit current increases from 35.1 mA/cm2 to 35.9 mA/cm2, where the power efficiency can increase from 21.9 % to 27.6 %. The super lattice quantum well structure as a electron/hole blocking layer has also been examined in this paper.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信