用脉冲激光退火法制备氧化石墨烯薄膜

2012 Conference on Lasers and Electro-Optics (CLEO) Pub Date : 2012-05-06 DOI:10.1364/CLEO_AT.2012.JW4A.121

Kun-Tso Chen, Yu-Hsuan Lin, J. Ho

{"title":"用脉冲激光退火法制备氧化石墨烯薄膜","authors":"Kun-Tso Chen, Yu-Hsuan Lin, J. Ho","doi":"10.1364/CLEO_AT.2012.JW4A.121","DOIUrl":null,"url":null,"abstract":"A laser-based thin-film processing scheme for printing and annealing of graphene oxide is reported. This method is able to print and simultaneously reduce the graphene oxide to graphene. The resulting graphene thin film is with good transmittance and its resistance is dramatically reduced from 200 MΩ to 80 KΩ.","PeriodicalId":6442,"journal":{"name":"2012 Conference on Lasers and Electro-Optics (CLEO)","volume":"144 1","pages":"1-2"},"PeriodicalIF":0.0000,"publicationDate":"2012-05-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Fabrication of graphene by pulsed laser annealing from a graphene oxide thin film\",\"authors\":\"Kun-Tso Chen, Yu-Hsuan Lin, J. Ho\",\"doi\":\"10.1364/CLEO_AT.2012.JW4A.121\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A laser-based thin-film processing scheme for printing and annealing of graphene oxide is reported. This method is able to print and simultaneously reduce the graphene oxide to graphene. The resulting graphene thin film is with good transmittance and its resistance is dramatically reduced from 200 MΩ to 80 KΩ.\",\"PeriodicalId\":6442,\"journal\":{\"name\":\"2012 Conference on Lasers and Electro-Optics (CLEO)\",\"volume\":\"144 1\",\"pages\":\"1-2\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-05-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 Conference on Lasers and Electro-Optics (CLEO)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/CLEO_AT.2012.JW4A.121\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 Conference on Lasers and Electro-Optics (CLEO)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/CLEO_AT.2012.JW4A.121","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

报道了一种用于氧化石墨烯打印和退火的激光薄膜加工方案。这种方法能够在打印的同时将氧化石墨烯还原为石墨烯。所得的石墨烯薄膜具有良好的透光率，其电阻从200 MΩ大幅降低到80 KΩ。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Fabrication of graphene by pulsed laser annealing from a graphene oxide thin film

A laser-based thin-film processing scheme for printing and annealing of graphene oxide is reported. This method is able to print and simultaneously reduce the graphene oxide to graphene. The resulting graphene thin film is with good transmittance and its resistance is dramatically reduced from 200 MΩ to 80 KΩ.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2012 Conference on Lasers and Electro-Optics (CLEO)

自引率

0.00%

发文量