量化标签线和地面空隙对真实DDR5眼缘的影响

Dirack Lai, Marc Chin, Zoe Liu, Rani Chen
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引用次数: 0

摘要

已经提出了标签线,以减少或消除远端串扰(FEXT)和阻抗管理[1],[2],[3]与SMT连接器着陆垫下的接地空隙实现DDR5通道,通过VNA或TDR进行标签传输线测量。本文提出了一种量化标签线和地面空隙对真实DDR5眼缘影响的方法。这种方法从测试板设计开始,有四个区域,即有标签、无标签、空穴和无空穴地,然后通过TDR进行阻抗检查。最后一步是执行四个区域的内存边界结果作为比较,量化标签线和地面空隙对实际DDR5眼边界的影响。[4],[5]。量化的结果可以作为标签线实施决策和地平面空隙补片机理的良好指标。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Quantified tabbed lines and ground void impact on real DDR5 eye margin
Tabbed lines have been proposed to reduce or eliminate far-end crosstalk (FEXT) and impedance management [1], [2], [3] with the ground void beneath SMT connector landing pad implementation for DDR5 channel from simulation and tabbed transmission line measurement by a VNA or TDR. In this paper, a method to quantify the tabbed lines and ground void impact on real DDR5 eye margin is proposed. This method starts with the test board design with fours zones of tabbed, non-tabbed, void and non-void ground and follow up with impedance check by a TDR. The final step is to perform four zones memory margin result as comparison to quantify the tabbed lines and ground void impact on real DDR5 eye margin. [4], [5]. The quantified results could be good indicators for tabbed lines implementation decision and ground plane void patch mechanism.
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