Al掺杂对ZnO薄膜结构和光学性能的影响

S. Najim, A. M. Muhammed, A. Pogrebnjak
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引用次数: 0

摘要

采用化学气相沉积(CVD)技术在玻璃衬底上合成了铝掺杂氧化锌薄膜。研究了铝含量(0、1、5、10 wt.%)对薄膜光学和结构性能的影响。在300-800nm宽波长范围内,所有薄膜的平均透过率均大于80%。对不同Al掺杂浓度的样品进行带隙能计算,带隙能在3左右。35 - 3.56 ev。x射线衍射结果表明,A1/ZnO薄膜具有(002)择优取向的六方纤锌矿结构。随着Al浓度的增加,ZnO样品的顶部和截面扫描电镜(SEM)显示出晶体生长结构。A$1^{3+}$掺杂ZnO会影响ZnO:A1薄膜的体积组成,导致表面粗糙度随着Al和O含量的增加而增加,平均Zn浓度降低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The Effect of Al Doping on Structure and Optical Properties of ZnO Thin Films
Aluminum doped zinc oxide thin films were synthesized by the chemical vapor deposition (CVD) on the glass substrate. The optical and structural properties of these films as a function of Al content (0,1,5,10 wt.%) were investigated. The average transmittance of all films is higher than 80% at a wide wavelength of 300-800nm. The bandgap energy, calculated for all samples with different Al dopant concentration, is around 3. 35-3.56eV. X-ray diffraction results reveal that A1/ZnO films have a hexagonal wurtzite structure with (002) preferred orientation. Top and cross-sectional scanning electron microscopy (SEM) micrographs of the prepared ZnO samples exhibit the crystalline growth structures by increasing Al concentration. Doping the ZnO with A$1^{3+}$ influences the volume composition of ZnO:A1 thin films, causes an increase in the surface roughness with an increase in the Al and O content, and a decrease in the average Zn concentration.
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