18nm SG隧道场效应晶体管的电位和电场模型

T. S. Arun Samuel, N. Balamurugan
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引用次数: 0

摘要

本文提出了一种新的单栅绝缘子上硅隧道场效应晶体管(tfet)二维解析模型。利用抛物近似技术求解具有合适边界条件的二维泊松方程。导出了表面电位和电场的解析表达式。在尺寸为18nm的器件上验证了模型的有效性,并将分析结果与TCAD仿真结果进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Potential and electric field model for 18 nm SG tunnel field effect transistor
In this paper, a new two dimensional (2D) analytical model of the single gate (SG) silicon-on-insulator (SOI) tunnel field effect transistors (TFETs) is presented. The parabolic approximation technique is used to solve the 2-D Poisson equation with suitable boundary conditions. Analytical expressions for surface potential and electric field are derived. The validity of the proposed model is tested for device scaled to 18-nm length and the analytical results are compared with TCAD simulations.
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