单相磁电多铁薄膜及其工艺研究进展

H. Yeo
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引用次数: 0

摘要

多铁性薄膜的生长和表征的进展为下一代存储器、纳米电子学和能量收集等新的器件应用提供了希望。在这篇综述中,我们简要概述了近年来在薄膜多铁性材料的生长、表征和理解方面的进展。在薄膜生长技术发展的推动下,生产高质量多铁薄膜的能力为研究人员提供了新的阶段和对这些材料的理解。讨论了外延应变和原子水平的化学工程决定了多态薄膜的性能。然后讨论了通过应变工程稳定的非平衡相的新结构和性质。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Review of Single-Phase Magnetoelectric Multiferroic Thin Film and Process
Advance in the growth and characterization of multiferroic thin film promises new device application such as next generation memory, nanoelectronics and energy harvesting. In this review, we provide a brief overview of recent progress in the growth, characterization and understanding of thin-film multiferroics. Driven by the development of thin film growth techniques, the ability to produce high quality multiferroic thin films offers researchers access to new phase and understanding of these materials. We discuss that epitaxial strain and atomic-level engineering of chemistry determine the muliferroic thin film properties. We then discuss the new structures and properties of non-equilibrium phases which is stabilized by strain engineering.
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