利用脉冲I-V和时域波形测量分析AlGaN/GaN hfet中的DC-RF色散

P. McGovern, J. Benedikt, P. Tasker, J. Powell, K. Hilton, J. Glasper, R. Balmer, T. Martin, M. Uren
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引用次数: 28

摘要

利用脉冲I-V测量和RF时域测量对AlGaN/GaN hfet进行了分析,试图分析DC-RF色散现象并获得最大的RF性能。脉冲I-V测量显示了电流暴跌的常见问题,器件的射频功率性能也是如此。射频时域波形表明射频膝走偏随漏极偏置电压的增加而增加,从而抵消了较大电压摆幅所能实现的功率和效率性能的任何改进。研究还发现,射频膝脱的程度取决于设备的操作类别。虽然电流下降是明显的,但它不是永久性的,并且在长时间的射频刺激后,设备的退化可以忽略不计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis of DC-RF dispersion in AlGaN/GaN HFETs using pulsed I-V and time-domain waveform measurements
AlGaN/GaN HFETs have been analyzed using pulsed I-V measurements and RF time-domain measurements in an attempt to analyze the phenomenon of DC-RF dispersion and achieve maximum RF performance. The pulsed I-V measurements exhibited the common problem of current slump, as did the RF power performance of the device. The RF time-domain waveforms are used to show that the RF knee-walkout increases with drain bias voltage, thus negating any improved power and efficiency performance that a larger voltage swing would achieve. It was also found that the degree of RF knee-walkout changes depending on the class of operation of the device. Although current slump is evident, it is not permanent, and there is negligible degradation of the device after prolonged RF stimulus.
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