{"title":"PPPS-2013:统计变异阵列的发射度和发射度","authors":"J. Petillo, D. Panagos, K. Jensen","doi":"10.1109/PLASMA.2013.6633506","DOIUrl":null,"url":null,"abstract":"Summary form only given. We report on the incorporation of a model of field emitters based on a Point Charge Model (PCM)1 that allows for rapid and analytical representations of tip current, variation, and emission statistics and its implementation and usage in the MICHELLE Particle-In-Cell (PIC) code2 to model the impact of emission variation on current characteristics and emittance. Rather than cold field emission characterized by the Fowler Nordheim equation, a General Thermal-Field (GTF) emission model3 treats warm and hot field emission sources. We shall compare the increases in emittance and beam radius due to emission non-uniformity as modeled by assuming a LogNormal (LN) distribution of emitter geometries4. The consequences for high frequency devices shall be explored.","PeriodicalId":6313,"journal":{"name":"2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)","volume":"8 1","pages":"1-1"},"PeriodicalIF":0.0000,"publicationDate":"2013-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"PPPS-2013: Emittance and emission from arrays with statistical variation\",\"authors\":\"J. Petillo, D. Panagos, K. Jensen\",\"doi\":\"10.1109/PLASMA.2013.6633506\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Summary form only given. We report on the incorporation of a model of field emitters based on a Point Charge Model (PCM)1 that allows for rapid and analytical representations of tip current, variation, and emission statistics and its implementation and usage in the MICHELLE Particle-In-Cell (PIC) code2 to model the impact of emission variation on current characteristics and emittance. Rather than cold field emission characterized by the Fowler Nordheim equation, a General Thermal-Field (GTF) emission model3 treats warm and hot field emission sources. We shall compare the increases in emittance and beam radius due to emission non-uniformity as modeled by assuming a LogNormal (LN) distribution of emitter geometries4. The consequences for high frequency devices shall be explored.\",\"PeriodicalId\":6313,\"journal\":{\"name\":\"2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)\",\"volume\":\"8 1\",\"pages\":\"1-1\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-06-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PLASMA.2013.6633506\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PLASMA.2013.6633506","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
PPPS-2013: Emittance and emission from arrays with statistical variation
Summary form only given. We report on the incorporation of a model of field emitters based on a Point Charge Model (PCM)1 that allows for rapid and analytical representations of tip current, variation, and emission statistics and its implementation and usage in the MICHELLE Particle-In-Cell (PIC) code2 to model the impact of emission variation on current characteristics and emittance. Rather than cold field emission characterized by the Fowler Nordheim equation, a General Thermal-Field (GTF) emission model3 treats warm and hot field emission sources. We shall compare the increases in emittance and beam radius due to emission non-uniformity as modeled by assuming a LogNormal (LN) distribution of emitter geometries4. The consequences for high frequency devices shall be explored.
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