氧化铝镓薄膜及其器件的最新进展

IF 8.1 2区材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY

Critical Reviews in Solid State and Materials Sciences Pub Date : 2021-06-28 DOI:10.1080/10408436.2021.1922357

A. Saikumar, S. Nehate, K. Sundaram

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引用次数: 14

摘要

摘要受氧化镓作为宽禁带半导体的成功启发，具有较高禁带值的氧化铝镓膜得到了广泛的研究。高带隙值的AGO薄膜成功地扩大了潜在的应用范围。在这篇综述中，我们全面总结了AGO的生长、性质和应用的最新进展。研究了沉积工艺及合成参数对AGO膜的影响。AGO薄膜的性能受生长技术和参数的影响，从而促进了AGO薄膜的应用。详细讨论了其电学性质、光学性质和形态学研究。最后，总结并展望未来。图形抽象

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A review of recent developments in aluminum gallium oxide thin films and devices

Abstract Inspired by the success of gallium oxide as a wide bandgap semiconductor, aluminum gallium oxide films which possess higher bandgap values have been researched extensively. Higher bandgap values of AGO films have successfully expanded the potential range of applications. In this review, we thoroughly summarize the recent developments in AGO growth, properties, and applications. Deposition techniques and the influence of synthesis parameters on AGO film are examined. Properties of AGO are influenced by the growth techniques and parameters, which promote the AGO films to be employed in desired applications. Electrical properties, optical properties, and morphological studies are discussed in detail. Finally, summary and future perspectives are identified. GRAPHICAL ABSTRACT

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来源期刊

Critical Reviews in Solid State and Materials Sciences 物理-材料科学：综合

CiteScore

22.10

自引率

2.80%

发文量

审稿时长

3 months

期刊介绍： Critical Reviews in Solid State and Materials Sciences covers a wide range of topics including solid state materials properties, processing, and applications. The journal provides insights into the latest developments and understandings in these areas, with an emphasis on new and emerging theoretical and experimental topics. It encompasses disciplines such as condensed matter physics, physical chemistry, materials science, and electrical, chemical, and mechanical engineering. Additionally, cross-disciplinary engineering and science specialties are included in the scope of the journal.