某些类型x射线结构分析方法中积分衍射强度表达式的修正

F. Anghelina, I. Popescu, C. Popa, D. Ungureanu, I. Popa
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引用次数: 0

摘要

用x射线衍射和较少的电子、中子等衍射技术和方法来研究精细结构是常用的方法。x射线技术的优点是价格便宜,提供精细有序结构水平的统计信息,并且不受物质磁性状态的显著干扰。但实验现实使事情变得复杂。入射光束的几何散度(垂直和水平)、与理想单色差的偏差以及衍射几何都会对积分衍射强度的表达式产生一定的修正。本文讨论了某些x射线结构分析方法中受这些因素影响的积分衍射强度的计算。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Correction of the Expression of the Integral Diffraction Intensity for Certain Types of X-Ray Structural Analysis Methods
Abstract Diffraction techniques and methods with X-rays and less diffraction of electrons, neutrons, etc. are frequently used to investigate the fine structure. X-ray techniques have the advantage that they are cheaper and provide statistical information at the level of fine ordered structure and are not significantly disturbed by the magnetic state of the substance. But the experimental reality complicates matters. The geometric divergence (vertical and horizontal) of the incident beam, the deviation from the ideal monochromatism and the diffraction geometry induce certain corrections for the expression of the integral diffraction intensity. This article addresses the calculation of the integral diffraction intensity affected by these factors for certain methods of X-ray structural analysis.
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