芝麻抗破碎荚果的遗传

A. Kotcha
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引用次数: 3

摘要

采用卡方检验对3个杂交的f2群体进行了芝麻抗碎荚膜的遗传研究。得到的破碎率:破碎率分别符合十字架破碎率×破碎率(C + 1 × KUsr6661)和破碎率×不断裂率(C + 1 × UCR5001)的15:1和9:7。结果表明,抗碎性是由两个基因分别具有重复显性上位性和重复隐性上位性引起的。但该杂交抗碎性x碎性(C + 1 x KUAOX 25)的卡方值不符合9:7模型,表明该杂交受两个以上基因的遗传控制。抗碎性具有较高的遗传力,狭义遗传力分别为0.74、0.73和0.68。结果表明,采用高抗碎性荚果或高荚果保持率的高产芝麻品系改良是可行的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Inheritance of Shatter Resistance Capsules in Sesame
Inheritance of shatter resistant capsule in sesame was studied on the F 2 populations in the three crosses using chi square test for goodness of fit.  The ratios obtained for shatter resistance: shattering fitted the 15:1 and 9:7 in the crosses shatter resistance x shatter resistance (C plus 1 x KUsr6661) and shatter resistance x indehiscence (C plus 1 x UCR5001) respectively.  The results indicating the shatter resistance is caused by two genes with duplicate dominant epistasis and duplicate recessive epistasis respectively. But chi square value of the cross shatter resistance x shattering (C plus 1 x KUAOX 25) could not fit the 9:7 model suggesting that genetic control by two more genes in this cross. The shatter resistance was highly heritable with narrow sense heritability at 0.74, 0.73 and 0.68 respectively. The results suggest that the improvement of sesame lines having high seed yield with highly shatter resistance capsule or high seed retention in capsule could be successful.
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