Dynamic mass isolation method utilized in self-moving precision positioning stage for improved speed performance.

The method of dynamic mass isolation is utilized in a self-moving precision positioning stage actuated by a piezostack to increase its moving speed. Two prototypes, namely, the referenced stage and the modified stage, have been fabricated. The only difference between the two stages is the flexure hinge manufactured in the modified stage to achieve an efficient dynamic mass isolation method. The step response has been investigated. The modified stage with dynamic mass isolation presents the average displacement of 6.6 µm with the applied step voltage being 55 V. By contrast, the referenced stage without dynamic mass isolation presents the average displacement of 1.6 µm. As a type of quasi-static piezoactuator/motors, the modified stage moves approximately four times faster than the referenced stage under the same driving frequency. By utilizing the dynamic mass isolation method, the modified stage still features the advantages of the referenced stage, such as cost-effective controllers, heavy-load capability, and motion of nanoscale. The concept and technique presented in this study can be applied to precision positioning stages for improved speed performance.