四分之一微米SIMOX-CMOS lvttl兼容门阵列,具有超过2,000 V的esd保护电路

Y. Ohtomo, T. Mizusawa, K. Nishimura, H. Sawada, M. Ino
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引用次数: 4

摘要

介绍了一种具有LVTTL接口的四分之一微米SIMOX-CMOS门阵列。SIMOX-CMOS门在1.2 V电源电压下具有与0.5-/spl mu/m CMOS门在3.3 V电源电压下相同的延迟,功耗降低87%。阵列中的接口电路将3.3 V的外部信号转换为2.0 V-1.2 V的内部信号,功率损失很小。该芯片的ESD保护电路在具有50纳米厚硅膜的先进SIMOX-CMOS中显示出超过2,000 V的ESD硬度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A quarter-micron SIMOX-CMOS LVTTL-compatible gate array with an over 2,000 V ESD-protection circuit
A quarter-micron SIMOX-CMOS gate array with an LVTTL interface is described. The SIMOX-CMOS gates have the same delay at 1.2 V of supply voltage as that of the gates in 0.5-/spl mu/m bulk CMOS at 3.3 V and reduce power consumption 87%. The interface circuits in the array convert 3.3 V external signal from/to 2.0 V-1.2 V internal signal with little power penalty. An ESD protection circuit for the chip shows over 2,000 V of ESD hardness in the advanced SIMOX-CMOS having 50-nm thick silicon film.
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CiteScore
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