滑动解离位错对III-V型化合物半导体{100}异质结错配的调节

B.C. De Cooman, C.B. Carter
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引用次数: 29

摘要

在晶格错配(100)半导体异质结处的位错形成可以理解为涉及涂层低温塑性变形的松弛过程。这种变形的一个简单模型表明,这些位错阵列在异质结的主要特征是可以预测的。结果表明,位错的解离性质及其αβ性质必须同时考虑。这种松弛过程中所涉及的位错类型取决于脱毛层最初是受压还是受压。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The accommodation of misfit at {100} heterojunctions in III–V compound semiconductors by gliding dissociated dislocations

The formation of dislocations at lattice-mismatched (100) semiconductor heterojunctions can be understood as a relaxation process involving the low-temperature plastic deformation of the epilayer. A simple model for this deformation shows that the main features of these dislocation arrays at the heterojunction can be predicted. It is shown that the dissociated nature of the dislocations and their αβ character must both be taken into account. The type of dislocations involved in this relaxation process depends on whether the epilayer is initially in compression or tension.

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