H型圆柱腔谐振器中合成的SiGe合金纳米线的生长机制

Charu Lata Dube , Subhash C. Kashyap , D.C. Dube
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引用次数: 0

摘要

本文试图了解在900°C的H型圆柱形微波腔谐振器中,在近5min的短时间内合成的SiGe合金纳米线的生长机理。研究了起始前驱体中环境、微波H场、与微波相互作用的持续时间和锗浓度的作用。据信,微波的H场在空气环境中与起始前驱体粉末有效地相互作用,并导致过热/过饱和,这导致通过非均匀成核形成无数临界尺寸的核,导致圆柱形纳米线的一维生长。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Growth mechanism of SiGe alloy nanowires synthesized in H-mode cylindrical cavity resonator

In the present paper an attempt has been made to understand the growth mechanism of SiGe alloy nanowires synthesized in H-mode cylindrical microwave cavity resonator at 900 °C in a short time of nearly 5 min. The role of ambience, microwave H-field, duration of interaction with microwaves and germanium concentration in the starting precursor have been investigated. It is believed that H-field of microwaves efficiently interacts with the starting precursor powder in air ambience and results in superheating/supersaturation, which gives rise to the formation of innumerable critical sized nuclei via heterogeneous nucleation, leading to one dimensional growth of cylindrical nanowires.

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