{"title":"通过表面硅化保护铜","authors":"F. Rebuffat, A. Galerie, M. Caillet, J. Besson","doi":"10.1016/0390-6035(82)90093-1","DOIUrl":null,"url":null,"abstract":"<div><p>A coating of Cu<sub>5</sub>Si on Cu was prepared by treating copper with monosilane at 700°C and its behaviour in oxygen at high temperature investigated. The protective efficiency of this coating is good as no oxidation could be detected up to 600°C. At higher temperatures, the oxidation scale consists of three layers respectively of Cu<sub>2</sub>O in contact with the metal, SiO<sub>2</sub>, and CuO. The kinetic curves are of sigmoidal type. Their first part corresponds probably to a nucleation process leading to the formation of the silica layer. In the following stages, the reaction rate is assumed to be controlled by the simultaneous diffusion of oxygen and copper through the SiO<sub>2</sub> and CuO layers.</p></div>","PeriodicalId":18221,"journal":{"name":"Materials Chemistry","volume":"7 4","pages":"Pages 517-535"},"PeriodicalIF":0.0000,"publicationDate":"1982-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0390-6035(82)90093-1","citationCount":"0","resultStr":"{\"title\":\"La protection du cuivre par siliciuration superficielle\",\"authors\":\"F. Rebuffat, A. Galerie, M. Caillet, J. Besson\",\"doi\":\"10.1016/0390-6035(82)90093-1\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>A coating of Cu<sub>5</sub>Si on Cu was prepared by treating copper with monosilane at 700°C and its behaviour in oxygen at high temperature investigated. The protective efficiency of this coating is good as no oxidation could be detected up to 600°C. At higher temperatures, the oxidation scale consists of three layers respectively of Cu<sub>2</sub>O in contact with the metal, SiO<sub>2</sub>, and CuO. The kinetic curves are of sigmoidal type. Their first part corresponds probably to a nucleation process leading to the formation of the silica layer. In the following stages, the reaction rate is assumed to be controlled by the simultaneous diffusion of oxygen and copper through the SiO<sub>2</sub> and CuO layers.</p></div>\",\"PeriodicalId\":18221,\"journal\":{\"name\":\"Materials Chemistry\",\"volume\":\"7 4\",\"pages\":\"Pages 517-535\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1982-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/0390-6035(82)90093-1\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Chemistry\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/0390603582900931\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Chemistry","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0390603582900931","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
La protection du cuivre par siliciuration superficielle
A coating of Cu5Si on Cu was prepared by treating copper with monosilane at 700°C and its behaviour in oxygen at high temperature investigated. The protective efficiency of this coating is good as no oxidation could be detected up to 600°C. At higher temperatures, the oxidation scale consists of three layers respectively of Cu2O in contact with the metal, SiO2, and CuO. The kinetic curves are of sigmoidal type. Their first part corresponds probably to a nucleation process leading to the formation of the silica layer. In the following stages, the reaction rate is assumed to be controlled by the simultaneous diffusion of oxygen and copper through the SiO2 and CuO layers.