利用二次离子质谱法对痕量成分进行深度分析

Journal of research of the National Bureau of Standards Pub Date : 1988-05-01 DOI:10.6028/jres.093.088

C. Magee

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引用次数: 1

摘要

[l] 鲍威尔，C.J.，澳大利亚。J.Phys。35.769（1982）。[2] Powell，C.J.，Appl。冲浪科学。4492（1980）。[3] Powell，C.J.，J.Vac。科学。Tech.A41532（1986）。f4J Bishop，H.E.，Chornik，B.，Le Gressus，C_。和Le Moe]。A.冲浪。接口分析。61116（1984）中描述的。（5）Doern，F.E.，Kover，L.和McIntyre，N.S.，《冲浪界面分析》第6期，第282页（1984年）。（61Powell，C.J.，Erickson，N.E.和Madey.TE.，J.Electron.Spectrosc.17361（1979）。[7] Seah，M.P.，Jones，M.E.和Anthony，M.T.，Surf。l表面分析。6242（1984）中描述。[8] Erickson，N.E.和Powell，C.J.，冲浪界面分析。9.III（1986）。[9] Seah，M.P.，《表面界面分析》。9，85（1986）。[致]Tanuma，S.、Powell，C.J.和Penn，D.R.冲浪科学。（印刷中）。[11] Powell，C.J.，电子材料与工艺。由N.H.Kordsmeier、C.A.Harper和S.M.Lee编辑，材料与工艺工程进步学会，加利福尼亚州科维纳（1987），第252页。[12] 鲍威尔，C.J.，冲浪。接口分析。（印刷中）。二次离子质谱法测定微量成分的深度

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Depth Profiling of Trace Constituents Using Secondary Ion Mass Spectrometry

[l] Powell, C. J., Aust. J. Phys. 35. 769 (1982). [2] Powell, C. J., Appl. Surf Sci. 4, 492 (1980). [3] Powell, C. J., J. Vac. Sci. Tech. A 4, 1532 (1986). f4J Bishop, H. E., Chornik, B., Le Gressus, C_. and Le Moe]. A., Surf. Interface Anal. 6, 116 (1984). (5] Doern, F. E., Kover, L., and McIntyre, N. S., Surf Interface Anal. 6, 282 (1984). (61 Powell, C. J., Erickson, N. E., and Madey. T. E., J. Electron. Spectrosc. 17, 361 (1979). [7] Seah, M. P., Jones, M. E., and Anthony, M. T., Surf. lIterface Anal. 6, 242 (1984). [8] Erickson, N. E., and Powell, C. J., Surf Interface Anal. 9. III (1986). [9] Seah, M. P., Surf Interface Anal. 9, 85 (1986). [to] Tanuma, S., Powell, C. J., and Penn, D. R.. Surf Sci. (in press). [11] Powell, C. J., Electronic Materials and Processes. edited by N. H. Kordsmeier, C. A. Harper, and S. M. Lee, Society for the Advancement of Material and Process Engineering, Covina, CA (1987), p. 252. [12] Powell, C. J., Surf. Interface Anal. (in press). Depth Profiling of Trace Constituents Using Secondary Ion Mass Spectrometry

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Journal of research of the National Bureau of Standards

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