室温等离子体辅助化学气相沉积氧化钛层

结晶过程及技术期刊(英文) Pub Date : 2014-01-02 DOI:10.4236/JCPT.2014.41003

S. Yamauchi, Hiromi Suzuki, R. Akutsu

{"title":"室温等离子体辅助化学气相沉积氧化钛层","authors":"S. Yamauchi, Hiromi Suzuki, R. Akutsu","doi":"10.4236/JCPT.2014.41003","DOIUrl":null,"url":null,"abstract":"Plasma-assisted chemical vapor deposition (PCVD) \nat pressure as low as 3 mtorr using titanium-tetra-isopropoxide (TTIP) and oxygen mixed gas plasma \ngenerated by 13.56 MHz radio frequency power (RF-power) below 70 W were applied to deposit titanium-oxide layer at \ntemperature under 40°C. Plasma optical emission spectroscopy and FTIR indicated \nthat density of OH group in the amorphous layer was related to the density of \nOH or H2O in the plasma and the species was formed on electrode to \ninduce the RF-power. Hydrophilicity on the layer was dependent on the density \nof chemisorbed OH, but was \ndegraded by the excess OH. The PCVD-TiOx coating was demonstrated \non polyethylene terephthalate and showed good hydrophilic property with the \ncontact angle of water about 5°.","PeriodicalId":64440,"journal":{"name":"结晶过程及技术期刊(英文)","volume":"4 1","pages":"20-26"},"PeriodicalIF":0.0000,"publicationDate":"2014-01-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Layer at Room-Temperature\",\"authors\":\"S. Yamauchi, Hiromi Suzuki, R. Akutsu\",\"doi\":\"10.4236/JCPT.2014.41003\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Plasma-assisted chemical vapor deposition (PCVD) \\nat pressure as low as 3 mtorr using titanium-tetra-isopropoxide (TTIP) and oxygen mixed gas plasma \\ngenerated by 13.56 MHz radio frequency power (RF-power) below 70 W were applied to deposit titanium-oxide layer at \\ntemperature under 40°C. Plasma optical emission spectroscopy and FTIR indicated \\nthat density of OH group in the amorphous layer was related to the density of \\nOH or H2O in the plasma and the species was formed on electrode to \\ninduce the RF-power. Hydrophilicity on the layer was dependent on the density \\nof chemisorbed OH, but was \\ndegraded by the excess OH. The PCVD-TiOx coating was demonstrated \\non polyethylene terephthalate and showed good hydrophilic property with the \\ncontact angle of water about 5°.\",\"PeriodicalId\":64440,\"journal\":{\"name\":\"结晶过程及技术期刊(英文)\",\"volume\":\"4 1\",\"pages\":\"20-26\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-01-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"结晶过程及技术期刊(英文)\",\"FirstCategoryId\":\"1087\",\"ListUrlMain\":\"https://doi.org/10.4236/JCPT.2014.41003\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"结晶过程及技术期刊(英文)","FirstCategoryId":"1087","ListUrlMain":"https://doi.org/10.4236/JCPT.2014.41003","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 8

摘要

采用等离子体辅助化学气相沉积(PCVD)技术，在低至3 mtorr的压力下，利用低于70 W的13.56 MHz射频功率(rf功率)产生的钛-四异丙醇(TTIP)和氧混合气体等离子体，在温度低于40℃的条件下沉积氧化钛层。等离子体发射光谱和FTIR表明，非晶层中OH基团的密度与等离子体中OH或H2O的密度有关，该物质在电极上形成，诱导射频功率。层的亲水性取决于化学吸附OH的密度，但被过量的OH降解。PCVD-TiOx涂层在聚对苯二甲酸乙二醇酯上进行了表征，具有良好的亲水性，水的接触角约为5°。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Layer at Room-Temperature

Plasma-assisted chemical vapor deposition (PCVD) at pressure as low as 3 mtorr using titanium-tetra-isopropoxide (TTIP) and oxygen mixed gas plasma generated by 13.56 MHz radio frequency power (RF-power) below 70 W were applied to deposit titanium-oxide layer at temperature under 40°C. Plasma optical emission spectroscopy and FTIR indicated that density of OH group in the amorphous layer was related to the density of OH or H2O in the plasma and the species was formed on electrode to induce the RF-power. Hydrophilicity on the layer was dependent on the density of chemisorbed OH, but was degraded by the excess OH. The PCVD-TiOx coating was demonstrated on polyethylene terephthalate and showed good hydrophilic property with the contact angle of water about 5°.

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结晶过程及技术期刊(英文)

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