多孔钽生产技术

纳米科学与工程(英文) Pub Date : 2016-04-15 DOI:10.4236/WJNSE.2016.62006

Y. Tuleushev, V. Volodin, Е. А. Zhakanbaev, V. Lisitsin, A. Migunova, A. Suleymenova

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引用次数: 0

摘要

采用离子等离子溅射和超细Ta和Cd颗粒在移动衬底上共沉积的方法制备了固溶体，特别是制备了高达66.2 at的合金。% Cd以涂层的形式存在。在真空热处理中，镉在700°c时从镉基固溶体中蒸发，形成具有高度发达表面的多孔钽。制备的钽基材料承担了研究成果的技术应用。

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Technology of Porous Tantalum Production

Ion-plasma sputtering and codeposition of ultrafine Ta and Cd particles on a moving substrate were used to prepare the solid solutions, in particular, the alloys with up to 66.2 at.% Cd in the form of coatings. In vacuum heat treatment cadmium evaporates at 700°C from cadmium based solid solutions resulting in formation of a porous tantalum with a highly developed surface. The prepared tantalum-based materials assume the technological application of the investigation results.

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来源期刊

纳米科学与工程(英文)

自引率

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发文量

103