高温下单电子晶体管漏极和栅极电流的新模型

A. Touati, S. Chatbouri, N. Sghaier, A. Kalboussi
{"title":"高温下单电子晶体管漏极和栅极电流的新模型","authors":"A. Touati, S. Chatbouri, N. Sghaier, A. Kalboussi","doi":"10.4236/WJNSE.2012.24022","DOIUrl":null,"url":null,"abstract":"We propose a novel analytical model to describe the drain-source current as well as gate-source of single-electron transistors (SETs) at high temperature. Our model consists on summing the tunnel current and thermionic contribution. This model will be compared with another model.","PeriodicalId":66816,"journal":{"name":"纳米科学与工程(英文)","volume":"02 1","pages":"171-175"},"PeriodicalIF":0.0000,"publicationDate":"2012-12-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"New Model for Drain and Gate Current of Single-Electron Transistor at High Temperature\",\"authors\":\"A. Touati, S. Chatbouri, N. Sghaier, A. Kalboussi\",\"doi\":\"10.4236/WJNSE.2012.24022\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We propose a novel analytical model to describe the drain-source current as well as gate-source of single-electron transistors (SETs) at high temperature. Our model consists on summing the tunnel current and thermionic contribution. This model will be compared with another model.\",\"PeriodicalId\":66816,\"journal\":{\"name\":\"纳米科学与工程(英文)\",\"volume\":\"02 1\",\"pages\":\"171-175\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-12-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"纳米科学与工程(英文)\",\"FirstCategoryId\":\"1089\",\"ListUrlMain\":\"https://doi.org/10.4236/WJNSE.2012.24022\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"纳米科学与工程(英文)","FirstCategoryId":"1089","ListUrlMain":"https://doi.org/10.4236/WJNSE.2012.24022","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8

摘要

我们提出了一种新的解析模型来描述高温下单电子晶体管的漏源电流和栅极电流。我们的模型是将隧道电流和热离子贡献相加。这个模型将与另一个模型进行比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
New Model for Drain and Gate Current of Single-Electron Transistor at High Temperature
We propose a novel analytical model to describe the drain-source current as well as gate-source of single-electron transistors (SETs) at high temperature. Our model consists on summing the tunnel current and thermionic contribution. This model will be compared with another model.
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