等离子体腔中Q因子对表面粗糙度的影响

Q Physics and Astronomy
Yoon-Ho Kim, Soon-Hong Kwon, H. Ee, Yongsop Hwang, You-Shin No, H. Park
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引用次数: 3

摘要

我们研究了由半导体纳米盘/纳米银结构组成的等离子体腔中表面粗糙度相关的光学损耗。数值模拟结果表明,等离子体共振模式的质量因子与腔体结构中介电-金属界面的表面粗糙度密切相关。在圆盘直径为1000 nm的结构中激发的横向类磁低语通道等离子体模式中,随着表面均方根(rms)粗糙度从0增加到5 nm,总质量因子从260降低到130。这一定量理论研究表明,光滑的金属表面在高性能等离子体器件中起着至关重要的作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dependence of Q Factor on Surface Roughness in a Plasmonic Cavity
We investigated surface-roughness-dependent optical loss in a plasmonic cavity consisting of a semiconductor nanodisk/silver nanopan structure. Numerical simulations show that the quality factors of plasmonic resonant modes significantly depend on the surface roughness of the dielectric-metal interface in the cavity structure. In the transverse-magnetic-like whispering-gallery plasmonic mode excited in a structure with disk diameter of 1000 nm, the total quality factor decreased from 260 to 130 with increasing root-mean-square (rms) surface roughness from 0 to 5 nm. This quantitative theoretical study shows that the smooth metal surface plays a critical role in high-performance plasmonic devices.
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来源期刊
CiteScore
0.70
自引率
0.00%
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审稿时长
2.3 months
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