不同厚度溅射氧化铟锡薄膜的电阻率、残余应力和表面粗糙度评价

IF 0.7 4区 物理与天体物理 Q4 OPTICS
Optica Applicata Pub Date : 2021-01-01 DOI:10.37190/oa210403
Chuen-Lin Tien, Tsai-Wei Lin, Shu-Hui Su
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引用次数: 0

摘要

研究了薄膜厚度对透明氧化铟锡薄膜电学和力学性能的影响。采用射频磁控溅射技术在非加热基底上制备了两组ITO薄膜。用Twyman-Green干涉仪和Linnik显微干涉仪分别测量了两组ITO薄膜的双轴残余应力和表面粗糙度。用四点探针测量ITO薄膜的电阻率,用轮廓仪机械测定薄膜的厚度。测量结果表明,ITO薄膜的平均电阻率随沉积厚度的增加而减小。ITO薄膜的残余压应力随沉积厚度的增加而减小。我们还发现两组ITO薄膜的各向异性应力在某一方向上更具有压缩性。两组ITO膜的RMS表面粗糙度均小于1 nm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Evaluation of electrical resistivity, residual stress and surface roughness of sputtering indium tin oxide films with different thicknesses
This paper investigates the influence of film thickness on the electrical and mechanical properties of transparent indium tin oxide (ITO) thin films. Two groups of ITO thin films deposited on unheated substrates were prepared by the radio-frequency magnetron sputtering technique. The biaxial residual stress and surface roughness for two groups of ITO thin films were measured by a Twyman–Green interferometer and a Linnik microscopic interferometer, respectively. The electrical resistivity of the ITO films was measured by a four-point probe apparatus, the thickness was determined mechanically with a profilometer. The measurement results show that the average resistivity of ITO thin films decreases with increasing the deposited thickness. The compressive residual stress in the ITO thin films decreases with increasing the deposited thickness. We also find that an anisotropic stress in the two groups of ITO films is more compressive in a certain direction. The RMS surface roughness in the two groups of ITO films is less than 1 nm.
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来源期刊
Optica Applicata
Optica Applicata 物理-光学
CiteScore
1.00
自引率
16.70%
发文量
21
审稿时长
4 months
期刊介绍: Acoustooptics, atmospheric and ocean optics, atomic and molecular optics, coherence and statistical optics, biooptics, colorimetry, diffraction and gratings, ellipsometry and polarimetry, fiber optics and optical communication, Fourier optics, holography, integrated optics, lasers and their applications, light detectors, light and electron beams, light sources, liquid crystals, medical optics, metamaterials, microoptics, nonlinear optics, optical and electron microscopy, optical computing, optical design and fabrication, optical imaging, optical instrumentation, optical materials, optical measurements, optical modulation, optical properties of solids and thin films, optical sensing, optical systems and their elements, optical trapping, optometry, photoelasticity, photonic crystals, photonic crystal fibers, photonic devices, physical optics, quantum optics, slow and fast light, spectroscopy, storage and processing of optical information, ultrafast optics.
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