Modification of the Ni-NiO-oxidant system by thermo-chemical oxidation with accelerated growth of the p-type dielectric oxide layer, by the action of substituted V2O5 on the system

Nickel is covered with very thin oxide film and is stable against corrosion under normal conditions. Nickel, as Ni-NiO-oxidant system, can make much thicker (even a thousand times) and more corrosion unstable oxides. With certain new oxidation process parameters, nickel can undergo so-called accelerated oxidation. The subject and goal of this work is to find the most favorable conditions for performing of accelerated - catastrophic Ni oxidation process, when substitution of V2O5 is carried out into NiO (2V (Ni)), with significant electron concentration increase and oxygen surplus. Unlimited main and secondary charge carriers transfer is significantly facilitated if oxide film with non-stoichiometric composition and defects is formed. The aim is to avoid compact oxide film formation by chemical-thermal treatments and to obtain porous and defective NiO. By using oxidized system Ni - NiO - oxidant in glass, ceramics and evaporated metal technology, extraordinary usable value of this work is ensured.