{"title":"3D-IC中非均匀热源TTSV的优化布置方法","authors":"Feng Dai, Zhong-liang Pan","doi":"10.2298/tsci220801021d","DOIUrl":null,"url":null,"abstract":"In the past few years, thermal through silicon via (TTSV) has been experimentally investigated as an effective heat dissipation path. Although a lot of heat dissipation-related issues have been solved in three-dimensional integrated circuit (3D-IC), there are neglections in TTSV placement with non-uniform heat sources so far. In this study, a unique optimization is proposed to locate TTSV while effectively alleviating hot spots in 3D-IC. The thermal dissipation of non-uniform heat sources are studied using the finite element method. The simulation results show that the minimum temperature is reduced by 2.1% compared with peak temperature in the single-layer chip, and by 1.9% in the three-layer chip.","PeriodicalId":23125,"journal":{"name":"Thermal Science","volume":"1 1","pages":""},"PeriodicalIF":1.1000,"publicationDate":"2023-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"An optimized method for TTSV placement with non-uniform heat sources in 3D-IC\",\"authors\":\"Feng Dai, Zhong-liang Pan\",\"doi\":\"10.2298/tsci220801021d\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In the past few years, thermal through silicon via (TTSV) has been experimentally investigated as an effective heat dissipation path. Although a lot of heat dissipation-related issues have been solved in three-dimensional integrated circuit (3D-IC), there are neglections in TTSV placement with non-uniform heat sources so far. In this study, a unique optimization is proposed to locate TTSV while effectively alleviating hot spots in 3D-IC. The thermal dissipation of non-uniform heat sources are studied using the finite element method. The simulation results show that the minimum temperature is reduced by 2.1% compared with peak temperature in the single-layer chip, and by 1.9% in the three-layer chip.\",\"PeriodicalId\":23125,\"journal\":{\"name\":\"Thermal Science\",\"volume\":\"1 1\",\"pages\":\"\"},\"PeriodicalIF\":1.1000,\"publicationDate\":\"2023-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Thermal Science\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://doi.org/10.2298/tsci220801021d\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"THERMODYNAMICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thermal Science","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.2298/tsci220801021d","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"THERMODYNAMICS","Score":null,"Total":0}
An optimized method for TTSV placement with non-uniform heat sources in 3D-IC
In the past few years, thermal through silicon via (TTSV) has been experimentally investigated as an effective heat dissipation path. Although a lot of heat dissipation-related issues have been solved in three-dimensional integrated circuit (3D-IC), there are neglections in TTSV placement with non-uniform heat sources so far. In this study, a unique optimization is proposed to locate TTSV while effectively alleviating hot spots in 3D-IC. The thermal dissipation of non-uniform heat sources are studied using the finite element method. The simulation results show that the minimum temperature is reduced by 2.1% compared with peak temperature in the single-layer chip, and by 1.9% in the three-layer chip.
期刊介绍:
The main aims of Thermal Science
to publish papers giving results of the fundamental and applied research in different, but closely connected fields:
fluid mechanics (mainly turbulent flows), heat transfer, mass transfer, combustion and chemical processes
in single, and specifically in multi-phase and multi-component flows
in high-temperature chemically reacting flows
processes present in thermal engineering, energy generating or consuming equipment, process and chemical engineering equipment and devices, ecological engineering,
The important characteristic of the journal is the orientation to the fundamental results of the investigations of different physical and chemical processes, always jointly present in real conditions, and their mutual influence. To publish papers written by experts from different fields: mechanical engineering, chemical engineering, fluid dynamics, thermodynamics and related fields. To inform international scientific community about the recent, and most prominent fundamental results achieved in the South-East European region, and particularly in Serbia, and - vice versa - to inform the scientific community from South-East European Region about recent fundamental and applied scientific achievements in developed countries, serving as a basis for technology development. To achieve international standards of the published papers, by the engagement of experts from different countries in the International Advisory board.