高熵合金AlCrFeCoNiCu主元素分析及微合金化的分子干扰研究

IF 0.7 Q4 CHEMISTRY, ANALYTICAL
V. D. Kurochkin, M. Kolomytsev, O. Romanenko
{"title":"高熵合金AlCrFeCoNiCu主元素分析及微合金化的分子干扰研究","authors":"V. D. Kurochkin, M. Kolomytsev, O. Romanenko","doi":"10.17721/moca.2022.43-53","DOIUrl":null,"url":null,"abstract":"The peculiarities of the glow discharge mass-spectrometry (GDMS) analysis of the main components and elements of microalloying of high-entropy AlCrFeCoNiCu alloy are considered in the paper. Molecular interferences of ArxAy+i, ArxG+i, AxBy+i types (where A, B are the components of the sample, G are single and 2-3 atomic gases; x, y = 1, 2, i - charge of ion, i = 1, 2), which are formed during cathode sputtering of this alloy in glow discharge plasma were calculated and experimentally tested. It is shown for spectrometers at resolution R0.5 ≥ 7000, the greatest influence of molecular ions of Me2+ and ArMe+ types exist in the range of isotope masses from 85Rb to about 107Ag. A careful selection of isotopes is required in this mass range to meet detection limit conditions. In other areas of the mass spectrum, the sensitivity of the analysis is limited by the background current and the sensitivity of the detectors and is at the usual ppb-level for this method.","PeriodicalId":18626,"journal":{"name":"Methods and Objects of Chemical Analysis","volume":"1 1","pages":""},"PeriodicalIF":0.7000,"publicationDate":"2022-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Investigation of Molecular Interferences at GDMS Analysis of Main Elements and Microalloing of High-Entropy Alloy AlCrFeCoNiCu\",\"authors\":\"V. D. Kurochkin, M. Kolomytsev, O. Romanenko\",\"doi\":\"10.17721/moca.2022.43-53\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The peculiarities of the glow discharge mass-spectrometry (GDMS) analysis of the main components and elements of microalloying of high-entropy AlCrFeCoNiCu alloy are considered in the paper. Molecular interferences of ArxAy+i, ArxG+i, AxBy+i types (where A, B are the components of the sample, G are single and 2-3 atomic gases; x, y = 1, 2, i - charge of ion, i = 1, 2), which are formed during cathode sputtering of this alloy in glow discharge plasma were calculated and experimentally tested. It is shown for spectrometers at resolution R0.5 ≥ 7000, the greatest influence of molecular ions of Me2+ and ArMe+ types exist in the range of isotope masses from 85Rb to about 107Ag. A careful selection of isotopes is required in this mass range to meet detection limit conditions. In other areas of the mass spectrum, the sensitivity of the analysis is limited by the background current and the sensitivity of the detectors and is at the usual ppb-level for this method.\",\"PeriodicalId\":18626,\"journal\":{\"name\":\"Methods and Objects of Chemical Analysis\",\"volume\":\"1 1\",\"pages\":\"\"},\"PeriodicalIF\":0.7000,\"publicationDate\":\"2022-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Methods and Objects of Chemical Analysis\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.17721/moca.2022.43-53\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"CHEMISTRY, ANALYTICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Methods and Objects of Chemical Analysis","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.17721/moca.2022.43-53","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"CHEMISTRY, ANALYTICAL","Score":null,"Total":0}
引用次数: 0

摘要

本文考虑了高熵AlCrFeCoNiCu合金微合金化主要成分和元素的辉光放电质谱分析的特殊性。ArxAy+i、ArxG+i、AxBy+i型分子干扰(其中A、B为样品组分,G为单原子气体和2-3原子气体;计算了该合金在辉光放电等离子体阴极溅射过程中形成的X, y = 1,2, I -离子电荷,I = 1,2),并进行了实验测试。结果表明,在分辨率为R0.5≥7000的光谱仪上,Me2+和ArMe+类型的分子离子在同位素质量85Rb到107Ag范围内的影响最大。在这个质量范围内,需要仔细选择同位素以满足检测极限条件。在质谱的其他领域,分析的灵敏度受到背景电流和探测器灵敏度的限制,并且在通常的ppb水平上使用这种方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of Molecular Interferences at GDMS Analysis of Main Elements and Microalloing of High-Entropy Alloy AlCrFeCoNiCu
The peculiarities of the glow discharge mass-spectrometry (GDMS) analysis of the main components and elements of microalloying of high-entropy AlCrFeCoNiCu alloy are considered in the paper. Molecular interferences of ArxAy+i, ArxG+i, AxBy+i types (where A, B are the components of the sample, G are single and 2-3 atomic gases; x, y = 1, 2, i - charge of ion, i = 1, 2), which are formed during cathode sputtering of this alloy in glow discharge plasma were calculated and experimentally tested. It is shown for spectrometers at resolution R0.5 ≥ 7000, the greatest influence of molecular ions of Me2+ and ArMe+ types exist in the range of isotope masses from 85Rb to about 107Ag. A careful selection of isotopes is required in this mass range to meet detection limit conditions. In other areas of the mass spectrum, the sensitivity of the analysis is limited by the background current and the sensitivity of the detectors and is at the usual ppb-level for this method.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
CiteScore
1.00
自引率
14.30%
发文量
12
期刊介绍: The journal "Methods and objects of chemical analysis" is peer-review journal and publishes original articles of theoretical and experimental analysis on topical issues and bio-analytical chemistry, chemical and pharmaceutical analysis, as well as chemical metrology. Submitted works shall cover the results of completed studies and shall make scientific contributions to the relevant area of expertise. The journal publishes review articles, research articles and articles related to latest developments of analytical instrumentations.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信