Si原子插入对Ti-Si-N复合材料形成的影响

J. González, J. Restrepo, C. Portilla, A. R. Muñoz, Federico Sequeda Osorio
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引用次数: 0

摘要

利用密度泛函理论(DFT)模拟了TiN和SiN的结构,研究了TiN晶格中硅原子的插入对面心立方(FCC)晶格中间隙和取代位置的影响。结果表明,SiN FCC结构是准稳定的;同时,四边形结构稳定,具有良好的陶瓷性能。TiN FCC结构稳定,具有类似于Si四方晶的陶瓷行为,21%的硅原子插入到间隙位置,表现出高诱导变形、高极化和Si - N键的形成,表明非晶过渡可能导致由嵌入Si - N非晶基体的TiN晶粒或纳米晶粒组成的材料。当
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of Si Atoms Insertion on the Formation of the Ti-Si-N Composite by DFT Simulation
Using Density Functional Theory (DFT) SiN and TiN structures were simulated, in order to study the influence of the silicon atoms insertion in the TiN lattice placed on interstitial and substitutional positions in a face centered cubic (FCC) crystalline lattice. Results showed that the SiN FCC structure is pseudo-stable; meanwhile the tetragonal structure is stable with ceramic behavior. The TiN FCC structure is stable with ceramic behavior similar to SiN Tetragonal. 21% silicon atoms insertion in interstitial positions showed high induced deformation, high polarization and Si N bond formation, indication an amorphous transition that could lead to the production of a material composed from TiN grains or nano-grains embedded in a Si N amorphous matrix. When
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