{"title":"石墨烯薄膜的化学气相沉积(CVD)生长","authors":"O. Frank, M. Kalbáč","doi":"10.1533/9780857099334.1.27","DOIUrl":null,"url":null,"abstract":"Abstract: The challenges and recent achievements in the chemical vapor deposition (CVD) production of graphene on nickel and copper substrates are reviewed. The formation of large-area monolayer domains, growth on single crystals and controlled formation of ordered multilayers are discussed in detail. Isotopic labeling is introduced as a tool to perform advanced studies on CVD graphene.","PeriodicalId":63892,"journal":{"name":"石墨烯(英文)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2021-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1533/9780857099334.1.27","citationCount":"13","resultStr":"{\"title\":\"Chemical vapor deposition (CVD) growth of graphene films\",\"authors\":\"O. Frank, M. Kalbáč\",\"doi\":\"10.1533/9780857099334.1.27\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract: The challenges and recent achievements in the chemical vapor deposition (CVD) production of graphene on nickel and copper substrates are reviewed. The formation of large-area monolayer domains, growth on single crystals and controlled formation of ordered multilayers are discussed in detail. Isotopic labeling is introduced as a tool to perform advanced studies on CVD graphene.\",\"PeriodicalId\":63892,\"journal\":{\"name\":\"石墨烯(英文)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1533/9780857099334.1.27\",\"citationCount\":\"13\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"石墨烯(英文)\",\"FirstCategoryId\":\"1089\",\"ListUrlMain\":\"https://doi.org/10.1533/9780857099334.1.27\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"石墨烯(英文)","FirstCategoryId":"1089","ListUrlMain":"https://doi.org/10.1533/9780857099334.1.27","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Chemical vapor deposition (CVD) growth of graphene films
Abstract: The challenges and recent achievements in the chemical vapor deposition (CVD) production of graphene on nickel and copper substrates are reviewed. The formation of large-area monolayer domains, growth on single crystals and controlled formation of ordered multilayers are discussed in detail. Isotopic labeling is introduced as a tool to perform advanced studies on CVD graphene.
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