浸笔和聚合物笔纳米光刻的量子点图像化

IF 3.3 Q3 NANOSCIENCE & NANOTECHNOLOGY
Soma Biswas, Falko Brinkmann, Michael Hirtz, H. Fuchs
{"title":"浸笔和聚合物笔纳米光刻的量子点图像化","authors":"Soma Biswas, Falko Brinkmann, Michael Hirtz, H. Fuchs","doi":"10.1515/nanofab-2015-0002","DOIUrl":null,"url":null,"abstract":"Abstract We present a direct way of patterning CdSe/ ZnS quantum dots by dip-pen nanolithography and polymer pen lithography. Mixtures of cholesterol and phospholipid 1,2-dioleoyl-sn-glycero-3 phosphocholine serve as biocompatible carrier inks to facilitate the transfer of quantum dots from the tips to the surface during lithography. While dip-pen nanolithography of quantum dots can be used to achieve higher resolution and smaller pattern features (approximately 1 μm), polymer pen lithography is able to address intermediate pattern scales in the low micrometre range. This allows us to combine the advantages of micro contact printing in large area and massive parallel patterning, with the added flexibility in pattern design inherent in the DPN technique.","PeriodicalId":51992,"journal":{"name":"Nanofabrication","volume":"2 1","pages":""},"PeriodicalIF":3.3000,"publicationDate":"2015-05-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1515/nanofab-2015-0002","citationCount":"19","resultStr":"{\"title\":\"Patterning of Quantum Dots by Dip-Pen and Polymer Pen Nanolithography\",\"authors\":\"Soma Biswas, Falko Brinkmann, Michael Hirtz, H. Fuchs\",\"doi\":\"10.1515/nanofab-2015-0002\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract We present a direct way of patterning CdSe/ ZnS quantum dots by dip-pen nanolithography and polymer pen lithography. Mixtures of cholesterol and phospholipid 1,2-dioleoyl-sn-glycero-3 phosphocholine serve as biocompatible carrier inks to facilitate the transfer of quantum dots from the tips to the surface during lithography. While dip-pen nanolithography of quantum dots can be used to achieve higher resolution and smaller pattern features (approximately 1 μm), polymer pen lithography is able to address intermediate pattern scales in the low micrometre range. This allows us to combine the advantages of micro contact printing in large area and massive parallel patterning, with the added flexibility in pattern design inherent in the DPN technique.\",\"PeriodicalId\":51992,\"journal\":{\"name\":\"Nanofabrication\",\"volume\":\"2 1\",\"pages\":\"\"},\"PeriodicalIF\":3.3000,\"publicationDate\":\"2015-05-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1515/nanofab-2015-0002\",\"citationCount\":\"19\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nanofabrication\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1515/nanofab-2015-0002\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"NANOSCIENCE & NANOTECHNOLOGY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nanofabrication","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1515/nanofab-2015-0002","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"NANOSCIENCE & NANOTECHNOLOGY","Score":null,"Total":0}
引用次数: 19

摘要

摘要提出了一种利用浸笔纳米光刻和聚合物笔光刻直接制取CdSe/ ZnS量子点的方法。在光刻过程中,胆固醇和磷脂- 1,2-二油基-sn-甘油-3磷酸胆碱的混合物作为生物相容性载体墨水,促进量子点从尖端转移到表面。虽然量子点的浸笔纳米光刻技术可以实现更高的分辨率和更小的图案特征(大约1 μm),但聚合物笔光刻技术能够解决低微米范围内的中间图案尺度。这使我们能够结合大面积微接触印刷和大规模平行图案的优势,以及DPN技术固有的图案设计灵活性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Patterning of Quantum Dots by Dip-Pen and Polymer Pen Nanolithography
Abstract We present a direct way of patterning CdSe/ ZnS quantum dots by dip-pen nanolithography and polymer pen lithography. Mixtures of cholesterol and phospholipid 1,2-dioleoyl-sn-glycero-3 phosphocholine serve as biocompatible carrier inks to facilitate the transfer of quantum dots from the tips to the surface during lithography. While dip-pen nanolithography of quantum dots can be used to achieve higher resolution and smaller pattern features (approximately 1 μm), polymer pen lithography is able to address intermediate pattern scales in the low micrometre range. This allows us to combine the advantages of micro contact printing in large area and massive parallel patterning, with the added flexibility in pattern design inherent in the DPN technique.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Nanofabrication
Nanofabrication NANOSCIENCE & NANOTECHNOLOGY-
自引率
10.30%
发文量
13
审稿时长
16 weeks
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信