溅射功率对ZnO薄膜纳米力学性能的影响

Q4 Engineering

International Journal of Materials and Structural Integrity Pub Date : 2015-01-01 DOI:10.1504/IJMSI.2015.075829

Miao Zhang, N. Liao, Pengfei Chen, W. Xue

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引用次数: 2

摘要

本研究采用不平衡磁控溅射法制备了高纯度ZnO靶材。采用纳米压痕和划痕试验研究了ZnO薄膜在不同溅射功率下的力学性能。实验结果表明，在最佳溅射功率下，杨氏模量、表面粗糙度和附着强度均达到最佳。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Effect of sputtering power on nano-mechanical properties of ZnO film

In this study, unbalanced magnetron sputtering approach was used to prepare ZnO film by using high-purity ZnO target. Nano-indentation and scratch test were used to study the mechanical properties of ZnO film at different sputtering powers. According to the experimental results, optimums of Young's modulus, surface roughness and adhesion strength are present at an optimal sputtering power.

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来源期刊

International Journal of Materials and Structural Integrity Engineering-Mechanical Engineering

CiteScore

0.40

自引率

0.00%

发文量