Conclusion and Future Directions.

Pulse-based sputter deposition processes have received considerable interest during the past decade because of the benefits this technology has been observed to offer over more conventionally employed sinusoidal (AC and RF) based technologies. The aim of this monograph has been to offer a guide for those interested in employing pulse-based sputter deposition processes. These processes include pulsed sputter deposition and pulsed bias sputter deposition. A central issue when considering why pulse-based technologies can be more beneficial than AC or RF based technologies is the energy of the ionic flux extracted from the plasma to a powered electrode. The central conclusion to be taken from this monograph is the shape of the applied bias (the amplitude, the frequency, and the duty) plays a critical role in dictating the energy of the ions from the plasma.