电场强度梯度的全光表面微图像化

Q3 Engineering

Advances in Optoelectronics Pub Date : 2015-11-05 DOI:10.1155/2015/917029

U. Gertners, J. Teteris

{"title":"电场强度梯度的全光表面微图像化","authors":"U. Gertners, J. Teteris","doi":"10.1155/2015/917029","DOIUrl":null,"url":null,"abstract":"In this report an all-optical photo-induced formation of surface relief gratings is shown. For the surface patterning of As2S3 and As4S1.5Se4.5 films a direct holographic recording setup with a 532 nm wavelength Nd:YAG CW laser light was used. Our investigations have shown that the light-induced mass transfer process strongly depends on the material itself and on the polarization of the light. It has been shown that an electric field intensity gradient has to be obtained to achieve a direct patterning. The evolution of a surface relief in relation to recording parameters and thickness of the sample has been investigated in detail.","PeriodicalId":7352,"journal":{"name":"Advances in Optoelectronics","volume":"2015 1","pages":"1-8"},"PeriodicalIF":0.0000,"publicationDate":"2015-11-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1155/2015/917029","citationCount":"1","resultStr":"{\"title\":\"All-Optical Surface Micropatterning by Electric Field Intensity Gradient\",\"authors\":\"U. Gertners, J. Teteris\",\"doi\":\"10.1155/2015/917029\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this report an all-optical photo-induced formation of surface relief gratings is shown. For the surface patterning of As2S3 and As4S1.5Se4.5 films a direct holographic recording setup with a 532 nm wavelength Nd:YAG CW laser light was used. Our investigations have shown that the light-induced mass transfer process strongly depends on the material itself and on the polarization of the light. It has been shown that an electric field intensity gradient has to be obtained to achieve a direct patterning. The evolution of a surface relief in relation to recording parameters and thickness of the sample has been investigated in detail.\",\"PeriodicalId\":7352,\"journal\":{\"name\":\"Advances in Optoelectronics\",\"volume\":\"2015 1\",\"pages\":\"1-8\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-11-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1155/2015/917029\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advances in Optoelectronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1155/2015/917029\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"Engineering\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in Optoelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1155/2015/917029","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"Engineering","Score":null,"Total":0}

引用次数: 1

摘要

在这个报告中，显示了全光学光诱导的表面浮雕光栅的形成。采用532 nm波长Nd:YAG连续激光直接全息记录装置对As2S3和as4s1.5 - se4.5薄膜进行表面图像化。我们的研究表明，光致传质过程在很大程度上取决于材料本身和光的偏振。已经证明，要实现直接的图案化，必须获得电场强度梯度。详细研究了表面起伏与记录参数和样品厚度的关系。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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All-Optical Surface Micropatterning by Electric Field Intensity Gradient

In this report an all-optical photo-induced formation of surface relief gratings is shown. For the surface patterning of As2S3 and As4S1.5Se4.5 films a direct holographic recording setup with a 532 nm wavelength Nd:YAG CW laser light was used. Our investigations have shown that the light-induced mass transfer process strongly depends on the material itself and on the polarization of the light. It has been shown that an electric field intensity gradient has to be obtained to achieve a direct patterning. The evolution of a surface relief in relation to recording parameters and thickness of the sample has been investigated in detail.

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来源期刊

Advances in Optoelectronics ENGINEERING, ELECTRICAL & ELECTRONIC-

CiteScore

1.30

自引率

0.00%

发文量

期刊介绍： Advances in OptoElectronics is a peer-reviewed, open access journal that publishes original research articles as well as review articles in all areas of optoelectronics.