硅-铝薄膜对中晶格声子和电子温度:玻尔兹曼方程与修正双方程模型的比较

B. S. Yilbas, S. Mansoor
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引用次数: 11

摘要

考察了硅铝膜对中的声子和载流子输运。由玻尔兹曼方程导出了铝薄膜中电子和晶格子系统的能量输运方程。计算了晶格声子和电子在硅膜和铝膜上的等效平衡温度。考虑了声子在硅界面处的反射和透射率对热边界电阻的影响。研究了膜厚对等效平衡温度的影响。将电子和晶格声子的温度预测结果与修正的铝膜双方程模型的结果进行了比较。结果表明,玻尔兹曼方程的解比修正的双方程模型的解预测的硅界面温度略高。随着铝膜厚度的增加,铝界面点阵声子温度的非线性行为向铝膜方向延伸。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Lattice Phonon and Electron Temperatures in Silicon-Aluminum Thin Films Pair: Comparison of Boltzmann Equation and Modified Two-Equation Model
Phonon and carrier transport in silicon-aluminum film pairs is examined. The energy transport equation for electrons and lattice subsystems for aluminum film is derived from the Boltzmann equation. Equivalent equilibrium temperature for lattice phonons and electrons are computed across the silicon and aluminum film. Reflection and transmittance of phonons at the silicon interface are considered to account for the thermal boundary resistance. The influence of film thickness on equivalent equilibrium temperature is also examined. Electron and lattice phonon temperature predictions are compared with their counterparts obtained from the modified two-equation model for the aluminum film. It is found that the solution of Boltzmann equation predicts slightly higher temperature at the silicon interface than that of the modified two-equation model. The nonlinear behavior of lattice phonon temperature at the aluminum interface extends toward the aluminum film with increasing film thickness.
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来源期刊
Transport Theory and Statistical Physics
Transport Theory and Statistical Physics 物理-物理:数学物理
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