纯和氧掺杂KCl单晶中32P的光退火和热退火反应

T. Andersen, J. Baptista
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引用次数: 3

摘要

利用反应堆辐照和离子注入技术,比较了纯KCl单晶和氧掺杂KCl单晶在热退火和光退火过程中的32p反冲行为。一种新型的32P(I)前驱体的存在是导致氧掺杂晶体在140°以下热退火的原因。f中心漂白后的纯KCl中也存在新的32P(I)前体。通过观察氧掺杂物和主晶格的辐射分解产物,确定了32P的价态分布的变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photo- and thermal-annealing reactions of 32P in pure and oxygen-doped KCl single crystals
The behaviour of 32P-recoils during thermal and photo-annealing has been compared in pure and oxygen-doped KCl single crystals using reactor irradiation and ion implantation techniques to generate the radiophosphorus. The existence of a new type of 32P(I)-precursor is shown to be responsible for thermal annealing below 140° in oxygen doped crystals. The new 32P(I)-precursor is also present in pure KCl after F-centre bleaching. The radiolysis products of the oxygen dopant and of the host lattice are observed to determine the variations in the valence distribution of 32P.
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