北京大学PIXE系统的校准

Zeqing Shen , Jipeng Zhu , Yuan Gao , Sha Yan , Jianming Xue , Yugang Wang
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引用次数: 0

摘要

采用粒子诱导X射线发射光谱法(PIXE)和弹性后向散射光谱法(EBS)相结合的方法对北京大学的PIXE系统进行了校准。所选的薄标准样品通常为50μg/cm2,两个厚标准样品的厚度为3mm。PIXE系统的标定分为薄标样的标定曲线测量和厚标样的外标法。薄样品和厚样品都覆盖了常用的PIXE X射线能量范围1.4–18.0 keV。GUPIXWIN引入了仪器因子H来描述校准过程。研究发现,测得的H(Z)曲线可以近似为一条Z无关线,平均值为3.30×10−4。单个元素的多次测量偏差在0.42%至4.75%之间。对于入射粒子为质子和3He+的厚样品,获得了(4.97±0.01)×10−4的H值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Calibration of a PIXE system at Peking University

A method combining particle-induced X-ray emission spectrometry (PIXE) and elastic backscattering spectrometry (EBS) was used to calibrate the PIXE system at Peking University. The selected thin standard samples were typically 50 μg/cm2 and the thicknesses of two thick standard samples are 3 mm. The calibration of PIXE system was divided into the calibration curve measurement of thin standard samples and the external standard method of thick standard samples. Both thin and thick samples cover the commonly used PIXE X-ray energy range 1.4–18.0 keV. GUPIXWIN introduces an Instrument factor H to describe the calibration process. It is found that the measured H(Z) curve can be approximated as a Z-independent line with an average value of 3.30×104. The deviation of multiple measurements of a single element is between 0.42% and 4.75%. For thick samples, the incident particles are protons and 3He+, a H value of (4.97±0.01)×104 was obtained.

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CiteScore
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