Performance investigation of Ge DLTFET based digital integrated circuit

ABSTRACT The article investigates the performance of germanium source doping-less tunnel FET (Ge DLTFET)-based digital integrated circuits. For this, the compact models have been developed for DLTFETs using Verilog-A approach. Furthermore, at circuit level, the performance of Ge DLTFET is compared with its conventional counterpart silicon source DLTFET (Si DLTEFT). Two digital benchmark circuits are considered for circuit simulation such as ring oscillator (RO) and conventional six-transistor static random-access memory (6 T SRAM). The simulation results depict that the operating frequency of Ge DLTFET RO is ~ 4.48 decade higher than Si DLTFET. Similarly, the performance of Ge DLTFET SRAM cell in terms of read and write delay is much better than its conventional counterpart Si DLTFET. Hence, Ge DLTFET can be considered as a promising device structure for high-speed digital circuit design and for its applications.