具有改进正向电流的互补低肖特基势垒S/ d纳米级无掺杂双向可重构场效应晶体管

IF 4.703 3区 材料科学
Xiaoshi Jin, Shouqiang Zhang, Chunrong Zhao, Meng Li, Xi Liu
{"title":"具有改进正向电流的互补低肖特基势垒S/ d纳米级无掺杂双向可重构场效应晶体管","authors":"Xiaoshi Jin,&nbsp;Shouqiang Zhang,&nbsp;Chunrong Zhao,&nbsp;Meng Li,&nbsp;Xi Liu","doi":"10.1186/s11671-023-03835-3","DOIUrl":null,"url":null,"abstract":"<div><p>In this paper, a nanoscale dopingless bidirectional RFET (BRFET) is proposed. Unlike conventional BRFETs, the proposed BRFET uses two different metal materials to form two different types of Schottky barriers on the interface between the S/D and silicon. For one of the two metal forms, the Schottky barrier height between the conduction band of the semiconductor and one of the two metal materials is lower than half of the energy band gap. The Schottky barrier height between the valence band of the semiconductor and the other kind of the two metal materials is lower than half of the energy band gap of the semiconductor. Therefore, a complementary low Schottky barrier (CLSB) is formed. Therefore, more carriers from the source electrode can easily flow into the semiconductor region through thermionic emission in both n-mode and p-mode compared to conventional BRFET operation, which generates carriers through the band-to-band tunneling effect. Therefore, a larger forward current can be achieved by the proposed CLSB-BRFET. The performance of the CLSB-BRFET is investigated by device simulation and compared with that of the BRFET. The working principle is interpreted through an analysis based on energy band theory. The output characteristics and reconfigurable function are also investigated and verified.</p></div>","PeriodicalId":715,"journal":{"name":"Nanoscale Research Letters","volume":"18 1","pages":""},"PeriodicalIF":4.7030,"publicationDate":"2023-03-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1186/s11671-023-03835-3.pdf","citationCount":"2","resultStr":"{\"title\":\"A complementary low-Schottky-barrier S/D-based nanoscale dopingless bidirectional reconfigurable field effect transistor with an improved forward current\",\"authors\":\"Xiaoshi Jin,&nbsp;Shouqiang Zhang,&nbsp;Chunrong Zhao,&nbsp;Meng Li,&nbsp;Xi Liu\",\"doi\":\"10.1186/s11671-023-03835-3\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>In this paper, a nanoscale dopingless bidirectional RFET (BRFET) is proposed. Unlike conventional BRFETs, the proposed BRFET uses two different metal materials to form two different types of Schottky barriers on the interface between the S/D and silicon. For one of the two metal forms, the Schottky barrier height between the conduction band of the semiconductor and one of the two metal materials is lower than half of the energy band gap. The Schottky barrier height between the valence band of the semiconductor and the other kind of the two metal materials is lower than half of the energy band gap of the semiconductor. Therefore, a complementary low Schottky barrier (CLSB) is formed. Therefore, more carriers from the source electrode can easily flow into the semiconductor region through thermionic emission in both n-mode and p-mode compared to conventional BRFET operation, which generates carriers through the band-to-band tunneling effect. Therefore, a larger forward current can be achieved by the proposed CLSB-BRFET. The performance of the CLSB-BRFET is investigated by device simulation and compared with that of the BRFET. The working principle is interpreted through an analysis based on energy band theory. The output characteristics and reconfigurable function are also investigated and verified.</p></div>\",\"PeriodicalId\":715,\"journal\":{\"name\":\"Nanoscale Research Letters\",\"volume\":\"18 1\",\"pages\":\"\"},\"PeriodicalIF\":4.7030,\"publicationDate\":\"2023-03-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://link.springer.com/content/pdf/10.1186/s11671-023-03835-3.pdf\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nanoscale Research Letters\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://link.springer.com/article/10.1186/s11671-023-03835-3\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nanoscale Research Letters","FirstCategoryId":"1085","ListUrlMain":"https://link.springer.com/article/10.1186/s11671-023-03835-3","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

本文提出了一种纳米级无掺杂双向RFET (BRFET)。与传统的BRFET不同,该BRFET使用两种不同的金属材料在S/D和硅之间的界面上形成两种不同类型的肖特基势垒。对于其中一种金属形式,半导体导带与其中一种金属材料之间的肖特基势垒高度低于能带隙的一半。半导体的价带与其他两种金属材料之间的肖特基势垒高度低于半导体的能带隙的一半。因此,形成了互补的低肖特基势垒(CLSB)。因此,与传统的BRFET工作相比,更多的载流子从源电极通过n模和p模的热离子发射容易流入半导体区,而传统的BRFET工作是通过带对带隧道效应产生载流子的。因此,所提出的CLSB-BRFET可以实现更大的正向电流。通过器件仿真研究了CLSB-BRFET的性能,并与BRFET进行了比较。通过基于能带理论的分析,解释了其工作原理。对输出特性和可重构功能进行了研究和验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A complementary low-Schottky-barrier S/D-based nanoscale dopingless bidirectional reconfigurable field effect transistor with an improved forward current

In this paper, a nanoscale dopingless bidirectional RFET (BRFET) is proposed. Unlike conventional BRFETs, the proposed BRFET uses two different metal materials to form two different types of Schottky barriers on the interface between the S/D and silicon. For one of the two metal forms, the Schottky barrier height between the conduction band of the semiconductor and one of the two metal materials is lower than half of the energy band gap. The Schottky barrier height between the valence band of the semiconductor and the other kind of the two metal materials is lower than half of the energy band gap of the semiconductor. Therefore, a complementary low Schottky barrier (CLSB) is formed. Therefore, more carriers from the source electrode can easily flow into the semiconductor region through thermionic emission in both n-mode and p-mode compared to conventional BRFET operation, which generates carriers through the band-to-band tunneling effect. Therefore, a larger forward current can be achieved by the proposed CLSB-BRFET. The performance of the CLSB-BRFET is investigated by device simulation and compared with that of the BRFET. The working principle is interpreted through an analysis based on energy band theory. The output characteristics and reconfigurable function are also investigated and verified.

求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Nanoscale Research Letters
Nanoscale Research Letters NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
15.00
自引率
0.00%
发文量
110
审稿时长
2.5 months
期刊介绍: Nanoscale Research Letters (NRL) provides an interdisciplinary forum for communication of scientific and technological advances in the creation and use of objects at the nanometer scale. NRL is the first nanotechnology journal from a major publisher to be published with Open Access.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信