{"title":"在暗场检测中确定用于图像拼接的重叠区域的大小","authors":"Dan Chen, Yuqin Wang, Rongzhu Zhang","doi":"10.1080/09500340.2023.2219777","DOIUrl":null,"url":null,"abstract":"Dark-field microscopic imaging system has high spatial resolution, but small image field. When an optical surface with a large-diameter is tested, the image stitching is necessary to obtain the full-aperture detection results. In this paper, Harris corner detection algorithm is used to achieve the full aperture testing result by stitching multiple detection images. According to the Shannon sampling theorem, how the size of the overlapping area influences the stitching results is analysed in detail. Combined with the spatial scale of surface defects, a method for determining the size of the overlapping area is given. The standard scratch patterns are used to simulate the stitching process. On this basis, an actual stitching processing is carried out on the detection images of surface scratches of four different spatial scales. Both the simulation and experimental results show that it is reasonable to use the scale of the smallest defect to determine the number of sampling points in the stitching area.","PeriodicalId":16426,"journal":{"name":"Journal of Modern Optics","volume":null,"pages":null},"PeriodicalIF":1.2000,"publicationDate":"2023-02-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Determining the size of the overlapping area for image stitching in dark-field detection\",\"authors\":\"Dan Chen, Yuqin Wang, Rongzhu Zhang\",\"doi\":\"10.1080/09500340.2023.2219777\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Dark-field microscopic imaging system has high spatial resolution, but small image field. When an optical surface with a large-diameter is tested, the image stitching is necessary to obtain the full-aperture detection results. In this paper, Harris corner detection algorithm is used to achieve the full aperture testing result by stitching multiple detection images. According to the Shannon sampling theorem, how the size of the overlapping area influences the stitching results is analysed in detail. Combined with the spatial scale of surface defects, a method for determining the size of the overlapping area is given. The standard scratch patterns are used to simulate the stitching process. On this basis, an actual stitching processing is carried out on the detection images of surface scratches of four different spatial scales. Both the simulation and experimental results show that it is reasonable to use the scale of the smallest defect to determine the number of sampling points in the stitching area.\",\"PeriodicalId\":16426,\"journal\":{\"name\":\"Journal of Modern Optics\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":1.2000,\"publicationDate\":\"2023-02-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Modern Optics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1080/09500340.2023.2219777\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"OPTICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Modern Optics","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1080/09500340.2023.2219777","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"OPTICS","Score":null,"Total":0}
Determining the size of the overlapping area for image stitching in dark-field detection
Dark-field microscopic imaging system has high spatial resolution, but small image field. When an optical surface with a large-diameter is tested, the image stitching is necessary to obtain the full-aperture detection results. In this paper, Harris corner detection algorithm is used to achieve the full aperture testing result by stitching multiple detection images. According to the Shannon sampling theorem, how the size of the overlapping area influences the stitching results is analysed in detail. Combined with the spatial scale of surface defects, a method for determining the size of the overlapping area is given. The standard scratch patterns are used to simulate the stitching process. On this basis, an actual stitching processing is carried out on the detection images of surface scratches of four different spatial scales. Both the simulation and experimental results show that it is reasonable to use the scale of the smallest defect to determine the number of sampling points in the stitching area.
期刊介绍:
The journal (under its former title Optica Acta) was founded in 1953 - some years before the advent of the laser - as an international journal of optics. Since then optical research has changed greatly; fresh areas of inquiry have been explored, different techniques have been employed and the range of application has greatly increased. The journal has continued to reflect these advances as part of its steadily widening scope.
Journal of Modern Optics aims to publish original and timely contributions to optical knowledge from educational institutions, government establishments and industrial R&D groups world-wide. The whole field of classical and quantum optics is covered. Papers may deal with the applications of fundamentals of modern optics, considering both experimental and theoretical aspects of contemporary research. In addition to regular papers, there are topical and tutorial reviews, and special issues on highlighted areas.
All manuscript submissions are subject to initial appraisal by the Editor, and, if found suitable for further consideration, to peer review by independent, anonymous expert referees.
General topics covered include:
• Optical and photonic materials (inc. metamaterials)
• Plasmonics and nanophotonics
• Quantum optics (inc. quantum information)
• Optical instrumentation and technology (inc. detectors, metrology, sensors, lasers)
• Coherence, propagation, polarization and manipulation (classical optics)
• Scattering and holography (diffractive optics)
• Optical fibres and optical communications (inc. integrated optics, amplifiers)
• Vision science and applications
• Medical and biomedical optics
• Nonlinear and ultrafast optics (inc. harmonic generation, multiphoton spectroscopy)
• Imaging and Image processing