电流放大器在超深亚微米技术中实现时的问题和特性

Simeon Dimitrov Kostadinov, I. Uzunov, D. Gaydazhiev
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引用次数: 1

摘要

本文考虑了在超深亚微米技术中实现电流放大器时与短沟道效应有关的问题。文中首先简要介绍了该电路,并对其基本参数进行了限制。概述了允许对电路进行近似设计的几个步骤。它们被应用于三种版本的放大器的设计,每种都是用具有不同沟道长度的FET实现的:90nm、45nm和30nm。对它们的基本特性进行了模拟和讨论,证明了缩短信道长度的主要好处——扩展了频带宽度。文中还简要考虑了通道长度较短的问题。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Problems and Properties of a Current Amplifier When Realized in Ultra Deep Sub-micron Technology
The paper considers the problems related to short-channel effects in a current amplifier, when realized in ultra-deep sub-micron technology. A short description of the circuit and a limitation concerning its basic parameters is given at the beginning. Several steps, allowing an approximate design of the circuit, are outlined. They are applied for design of three versions of the amplifier, each of them is realized with FETs having different channel length: 90 nm, 45 nm and 30 nm. Their basic properties are simulated and discussed, demonstrating the major benefit of the shortening of the channel length—extension of the frequency bandwidth. The problems arising with the shorter channels length are also considered briefly.
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