化学机械抛光固体和离子表面反应形式对表面质量的影响分析

Q2 Engineering

Journal of Machine Engineering Pub Date : 2022-05-04 DOI:10.36897/jme/149496

LeManh Duc, P. Hiếu, N. Mai, T. Trong, Nguyen Quang

{"title":"化学机械抛光固体和离子表面反应形式对表面质量的影响分析","authors":"LeManh Duc, P. Hiếu, N. Mai, T. Trong, Nguyen Quang","doi":"10.36897/jme/149496","DOIUrl":null,"url":null,"abstract":"POLISHING The process of removing machining residues using chemical-mechanical slurry (CMS) has an important place in the creation of ultra-precise components in optical devices. Based on this feature, this work investigates the efficiency of the CMS polishing process by comparing the surface reaction modes by the ionic and solid reaction modes when polishing the yttrium aluminum garnet (YAG) and sapphire crystal. The study procedures were conducted to clarify the polishing performance corresponding to these two reaction types. The obtained experiments results show that the balance between the mechanical effect process using CMS polishing technology with chemical effect can be achieved with the ionic reaction mode. The results also show that the ionic surface reaction modes give more uniform material removal than the solid reaction on YAG and sapphire crystal surfaces. Therefore, the surface quality when polished by CMS technology with ionic surface reaction modes is better than that of solid surface","PeriodicalId":37821,"journal":{"name":"Journal of Machine Engineering","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2022-05-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Analysis of Solid and Ionic Surface Reaction Form to Surface Quality when Using Chemical-Mechanical Slurry Polishing\",\"authors\":\"LeManh Duc, P. Hiếu, N. Mai, T. Trong, Nguyen Quang\",\"doi\":\"10.36897/jme/149496\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"POLISHING The process of removing machining residues using chemical-mechanical slurry (CMS) has an important place in the creation of ultra-precise components in optical devices. Based on this feature, this work investigates the efficiency of the CMS polishing process by comparing the surface reaction modes by the ionic and solid reaction modes when polishing the yttrium aluminum garnet (YAG) and sapphire crystal. The study procedures were conducted to clarify the polishing performance corresponding to these two reaction types. The obtained experiments results show that the balance between the mechanical effect process using CMS polishing technology with chemical effect can be achieved with the ionic reaction mode. The results also show that the ionic surface reaction modes give more uniform material removal than the solid reaction on YAG and sapphire crystal surfaces. Therefore, the surface quality when polished by CMS technology with ionic surface reaction modes is better than that of solid surface\",\"PeriodicalId\":37821,\"journal\":{\"name\":\"Journal of Machine Engineering\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-05-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Machine Engineering\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.36897/jme/149496\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"Engineering\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Machine Engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.36897/jme/149496","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"Engineering","Score":null,"Total":0}

引用次数: 2

摘要

抛光使用化学机械浆料（CMS）去除加工残留物的过程在光学器件中制造超精密元件方面具有重要地位。基于这一特点，本工作通过比较离子和固体反应模式在抛光钇铝石榴石（YAG）和蓝宝石晶体时的表面反应模式，研究了CMS抛光工艺的效率。进行研究程序是为了阐明与这两种反应类型相对应的抛光性能。实验结果表明，离子反应模式可以实现CMS抛光技术的机械效应过程与化学效应之间的平衡。结果还表明，离子表面反应模式比YAG和蓝宝石晶体表面的固体反应更均匀地去除材料。因此，采用离子表面反应模式的CMS技术抛光时的表面质量优于固体表面

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Analysis of Solid and Ionic Surface Reaction Form to Surface Quality when Using Chemical-Mechanical Slurry Polishing

POLISHING The process of removing machining residues using chemical-mechanical slurry (CMS) has an important place in the creation of ultra-precise components in optical devices. Based on this feature, this work investigates the efficiency of the CMS polishing process by comparing the surface reaction modes by the ionic and solid reaction modes when polishing the yttrium aluminum garnet (YAG) and sapphire crystal. The study procedures were conducted to clarify the polishing performance corresponding to these two reaction types. The obtained experiments results show that the balance between the mechanical effect process using CMS polishing technology with chemical effect can be achieved with the ionic reaction mode. The results also show that the ionic surface reaction modes give more uniform material removal than the solid reaction on YAG and sapphire crystal surfaces. Therefore, the surface quality when polished by CMS technology with ionic surface reaction modes is better than that of solid surface

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Journal of Machine Engineering Engineering-Industrial and Manufacturing Engineering

CiteScore

2.70

自引率

0.00%

发文量

审稿时长

25 weeks

期刊介绍： ournal of Machine Engineering is a scientific journal devoted to current issues of design and manufacturing - aided by innovative computer techniques and state-of-the-art computer systems - of products which meet the demands of the current global market. It favours solutions harmonizing with the up-to-date manufacturing strategies, the quality requirements and the needs of design, planning, scheduling and production process management. The Journal'' s subject matter also covers the design and operation of high efficient, precision, process machines. The Journal is a continuator of Machine Engineering Publisher for five years. The Journal appears quarterly, with a circulation of 100 copies, with each issue devoted entirely to a different topic. The papers are carefully selected and reviewed by distinguished world famous scientists and practitioners. The authors of the publications are eminent specialists from all over the world and Poland. Journal of Machine Engineering provides the best assistance to factories and universities. It enables factories to solve their difficult problems and manufacture good products at a low cost and fast rate. It enables educators to update their teaching and scientists to deepen their knowledge and pursue their research in the right direction.